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推薦產品
形狀
liquid
折射率
n20/D 1.498 (lit.)
bp
117 °C (lit.)
mp
−28 °C (lit.)
密度
1.205 g/mL at 25 °C (lit.)
SMILES 字串
CC[Zn]CC
InChI
1S/2C2H5.Zn/c2*1-2;/h2*1H2,2H3;
InChI 密鑰
HQWPLXHWEZZGKY-UHFFFAOYSA-N
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一般說明
Atomic number of base material: 30 Zinc
應用
Reacted with water in a low temperature (<200°C) atomic layer deposition of polycrystalline ZnO layers displaying exciton photoluminescence at room temperature.[1]
訊號詞
Danger
危險分類
Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
安全危害
儲存類別代碼
4.2 - Pyrophoric and self-heating hazardous materials
水污染物質分類（WGK）
WGK 3
閃點（°F）
Not applicable
閃點（°C）
Not applicable
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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文章
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.
原子層沉積可滿足各種需求，包括半導體裝置微型化及奈米塗層。
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Continuous efficiency improvements in photovoltaic devices result from material advancements and manufacturing innovation.
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