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About This Item
線性公式:
[(CH3)2N]4Hf
CAS號碼:
分子量：:
354.79
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23
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推薦產品
化驗
≥99.99% (trace metals analysis)
形狀
low-melting solid
反應適用性
core: hafnium
mp
26-29 °C (lit.)
密度
1.098 g/mL at 25 °C
SMILES 字串
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI 密鑰
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
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訊號詞
Danger
危險聲明
危險分類
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
安全危害
儲存類別代碼
4.3 - Hazardous materials which set free flammable gases upon contact with water
水污染物質分類（WGK）
WGK 3
閃點（°F）
109.4 °F - closed cup
閃點（°C）
43 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
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文章
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
High Purity Metalorganic Precursors for CPV Device Fabrication
再加上高光照濃度下的高轉換效率以增加輸出，CPV 很有希望成為下一個發電技術。
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