Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
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Tantalum(V) fluoride can be used:
As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.[1]
As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.[2]
To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).[3]
As a catalyst for N-alkylation of arylamines with benzylalcohols.