- Rapid and Versatile Photonic Annealing of Graphene Inks for Flexible Printed Electronics.
Rapid and Versatile Photonic Annealing of Graphene Inks for Flexible Printed Electronics.
Advanced materials (Deerfield Beach, Fla.) (2015-10-01)
Ethan B Secor, Bok Y Ahn, Theodore Z Gao, Jennifer A Lewis, Mark C Hersam
PMID26422363
RÉSUMÉ
Intense pulsed light (IPL) annealing of graphene inks is demonstrated for rapid post-processing of inkjet-printed patterns on various substrates. A conductivity of ≈25,000 S m(-1) is achieved following a single printing pass using a concentrated ink containing 20 mg mL(-1) graphene, establishing this strategy as a practical and effective approach for the versatile and high-performance integration of graphene in printed and flexible electronics.
MATÉRIAUX
Référence du produit
Marque
Description du produit
Sigma-Aldrich
Chlorure de sodium, for molecular biology, DNase, RNase, and protease, none detected, ≥99% (titration)
Sigma-Aldrich
Chlorure de sodium solution, 5 M in H2O, BioReagent, for molecular biology, suitable for cell culture
Sigma-Aldrich
Chlorure de sodium, BioReagent, suitable for cell culture, suitable for insect cell culture, suitable for plant cell culture, ≥99%
Sigma-Aldrich
Chlorure de sodium, meets analytical specification of Ph. Eur., BP, USP, 99.0-100.5%
Sigma-Aldrich
Activated Charcoal Norit®, Norit® GAC 1240W, from coal, for potable water processing, steam activated, granular
Sigma-Aldrich
Activated Charcoal Norit®, Norit® SX ultra, from peat, corresponds U.S. Food chemicals codex (3rd Ed.), steam activated and acid washed, highly purified, powder
Sigma-Aldrich
Éthanol, purum, fine spirit, denaturated with 4.8% methanol, F25 METHYL1, ~96% (based on denaturant-free substance)
Sigma-Aldrich
Carbon nanofibers, graphitized, platelets(conical), >98% carbon basis, D × L 100 nm × 20-200 μm
Sigma-Aldrich
Carbon, mesoporous, nanopowder, less than 500 ppm Al, Ti, Fe, Ni, Cu, and Zn combined
Sigma-Aldrich
Carbon nanofibers, pyrolitically stripped, platelets(conical), >98% carbon basis, D × L 100 nm × 20-200 μm