900755

SLAP TA

95%

• Sinonimo/i: 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• Formula empirica (notazione di Hill): C₇H₁₉NSSi
• Numero CAS: 2093935-86-3
• Peso molecolare: 177.38
• Numero MDL: MFCD31560650
• Codice UNSPSC: 12352103
• NACRES: NA.22

Proprietà

• Livello qualitativo: 100
• Saggio: 95%
• Stato: liquid
• Densità: 0.90452
• Gruppo funzionale: amine; thioether
• Temperatura di conservazione: 2-8°C
• Stringa SMILE: [Si](CSCCCN)(C)(C)C
• InChI: 1S/C7H19NSSi/c1-10(2,3)7-9-6-4-5-8/h4-8H2,1-3H3; CNESDLLESCAVSR-UHFFFAOYSA-N

Descrizione

Applicazioni

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Altre note

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informazioni sulla sicurezza

• Pittogrammi: GHS02
• Avvertenze: Warning
• Indicazioni di pericolo: H226
• Consigli di prudenza: P210 - P370 + P378
• Classi di pericolo: Flam. Liq. 3
• Codice della classe di stoccaggio: 3 - Flammable liquids
• Classe di pericolosità dell'acqua (WGK): WGK 3
• Punto d’infiammabilità (°F): 75.0 °F
• Punto d’infiammabilità (°C): 23.89 °C