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Merck

668729

Sigma-Aldrich

二乙基锌

packaged for use in deposition systems

别名:

DEZ, Zincdiethyl

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About This Item

线性分子式:
(C2H5)2Zn
CAS号:
分子量:
123.51
Beilstein:
3587207
EC 号:
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.23

质量水平

表单

liquid

折射率

n20/D 1.498 (lit.)

沸点

117 °C (lit.)

mp

−28 °C (lit.)

密度

1.205 g/mL at 25 °C (lit.)

SMILES字符串

CC[Zn]CC

InChI

1S/2C2H5.Zn/c2*1-2;/h2*1H2,2H3;

InChI key

HQWPLXHWEZZGKY-UHFFFAOYSA-N

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一般描述

Atomic number of base material: 30 Zinc

应用

Reacted with water in a low temperature (<200°C) atomic layer deposition of polycrystalline ZnO layers displaying exciton photoluminescence at room temperature.

警示用语:

Danger

危险分类

Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

补充剂危害

储存分类代码

4.2 - Pyrophoric and self-heating hazardous materials

WGK

WGK 3

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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Journal of Applied Physics, 103, 033515-033515 (2008)
Efficient chirality switching in the addition of diethylzinc to aldehydes in the presence of simple chiral alpha-amino amides.
M Isabel Burguete et al.
Angewandte Chemie (International ed. in English), 46(47), 9002-9005 (2007-09-26)
Isabelle Bonnaventure et al.
The Journal of organic chemistry, 73(16), 6330-6340 (2008-07-22)
The hemilabile ligand Me-DuPHOS(O) 2 has proven to be a successful ligand for the copper-catalyzed addition of diethylzinc to N-phosphinoylimines. The corresponding alpha-chiral amines were obtained in high yields (80-98%) and enantiomeric ratios (19.0:1 to 99.0:1 er). Furthermore, this Cu*
Vincent Coeffard et al.
Organic & biomolecular chemistry, 7(8), 1723-1734 (2009-04-04)
The straightforward preparation of new modular oxazoline-containing bifunctional catalysts is reported employing a microwave-assisted Buchwald-Hartwig aryl amination as the key step. Covalent attachment of 2-(o-aminophenyl)oxazolines and pyridine derivatives generated in good-to-high yields a series of ligands in two or three
Sang-Jin Jeon et al.
Journal of the American Chemical Society, 127(47), 16416-16425 (2005-11-25)
There is a great demand for development of catalyst systems that are not only efficient and highly enantioselective but are also environmentally benign. Herein we report investigations into the catalytic asymmetric addition of alkyl and functionalized alkyl groups to ketones

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近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Continuous efficiency improvements in photovoltaic devices result from material advancements and manufacturing innovation.

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