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等級
semiconductor grade VLSI PURANAL™ (Honeywell 17617)
蒸汽密度
2 (vs air)
蒸汽壓力
184 mmHg ( 20 °C)
形狀
liquid
CofA
specification on request
expl. lim.
13.2 %
顏色
clear colorless
折射率
n20/D 1.359 (lit.)
bp
56 °C/760 mmHg (lit.)
mp
−94 °C (lit.)
密度
0.791 g/mL at 25 °C (lit.)
格式
neat
SMILES 字串
CC(C)=O
InChI
1S/C3H6O/c1-3(2)4/h1-2H3
InChI 密鑰
CSCPPACGZOOCGX-UHFFFAOYSA-N
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應用
丙酮的发光强度取决于溶液组分。丙酮吸收UV光,导致丙酮光分解和放射性产物。
Semiconductor grade acetone may be used for cleaning of the surfaces, such as;
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
- Hydrogen terminated silicon wafer.
- SiC wafers.
- Chromium nitride epilayer on silicon wafer.
The semiconductor grade acetone was also used in a comparative study for observing the effect of various solvents on nitrogen containing promoters (NCPs), which is used in oxidation reaction of 5-hydroxymethylfurfural.
法律資訊
PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH
訊號詞
Danger
危險聲明
危險分類
Eye Irrit. 2 - Flam. Liq. 2 - STOT SE 3
標靶器官
Central nervous system
安全危害
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 1
閃點(°F)
1.4 °F - closed cup
閃點(°C)
-17.0 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves
Mono-fluorinated alkyne-derived SAMs on oxide-free Si (111) surfaces: preparation, characterization and tuning of the Si workfunction
Langmuir, 29(2), 570-580 (2013)
Covalently attached organic monolayers onto silicon carbide from 1-alkynes: molecular structure and tribological properties.
Langmuir, 29(13), 4019-4031 (2013)
Cu catalyzed oxidation of 5-hydroxymethylfurfural to 2, 5-diformylfuran and 2, 5-furandicarboxylic acid under benign reaction conditions.
Applied Catalysis A: General, 456, 44-50 (2013)
Organic monolayers from 1-alkynes covalently attached to chromium nitride: alkyl and fluoroalkyl termination.
Langmuir, 29(33), 10393-10404 (2013)
Hexadecadienyl monolayers on hydrogen-terminated Si (111): faster monolayer formation and improved surface coverage using the enyne moiety
Langmuir, 28(16), 6577-6588 (2012)
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