901482

六甲基二硅氮烷

20% solution in xylene

• 同義詞: HMDS
• 線性公式: C₆H₁₉NSi₂
• CAS號碼: 999-97-3
• 分類程式碼代碼: 12352103
• NACRES: NA.23

屬性

• 形狀: liquid
• InChI: 1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
• InChI 密鑰: FFUAGWLWBBFQJT-UHFFFAOYSA-N

描述

一般說明

The product is used to augment the adhesion of photoresist on silicon and SiO₂ surfaces.
The effectiveness of HMDS on adhesion is correlated with the reactivity of this compound with surface hydroxyl groups to form a new siloxane end product, i.e. Si-O-Si(CH₃)₃. This newly formed termination on the substrate renders the surface more hydrophobic in character and leads to greater wettability by photoresist. The latter condition is a crucial factor in good bonding. As a result of these altered characteristics due to the surface chemistry, the treated silicon surfaces become highly compatible with both negative and positive photoresists.

應用

HMDS preparations are generally applied to the silicon wafer while spinning, prior to the application of photoresist. As an alternative procedure, the wafers may be immersed in HMDS preparations and allowed to dry after removal.

特點和優勢

• Ready-to-use preparations for surface treatment of silicon.
• Promotes photoresist adhesion on silicon and SiO₂ films.
• Prevents lift-off at edges of photoresist and reduces undercutting.
• Ensures full-line resolution.
• Improves yields of MOS and integrated silicon devices.

安全資訊

• 象形圖: GHS02,GHS06,GHS08
• 訊號詞: Danger
• 危險聲明: H226,H304,H311,H315,H319,H332,H335,H373,H412
• 防範說明: P210 - P273 - P280 - P301 + P310 - P303 + P361 + P353 - P331
• 危險分類: Acute Tox. 3 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT RE 2 - STOT SE 3
• 標靶器官: hearing organs, Respiratory system
• 儲存類別代碼: 3 - Flammable liquids
• 水污染物質分類（WGK）: WGK 2
• 閃點（°F）: 76.1 °F
• 閃點（°C）: 24.5 °C