We've ordered 3 bottles at this point. The first arrived having leaked in the sealed container. The second arrived fine, but leaked within two weeks. The third seemed okay until this weekend, when it leaked a significant volume after only a month of storage. I would encourage you to avoid this product unless the container material is changed, as all three sealed bottles appeared to be limited in their stability compared to alternative strip solutions.
推薦產品
形狀
liquid
一般說明
Pure Strip is suitable for stripping both positive and negative photoresists in addition to other organic compounds in a variety of semiconductor, photomask, and IC photolithography compounds. High yields can be achieved due to the high purity/low particulate composition of Pure Strip.
Advantages Pure Strip include negligible attack on exposed metal surfaces, including aluminum, vs. other acidic formulations, residue-free rinsing, and extended bath life (minimum of five days at room temperature). Pure Strip is ready to use and requires no mixing.
Advantages Pure Strip include negligible attack on exposed metal surfaces, including aluminum, vs. other acidic formulations, residue-free rinsing, and extended bath life (minimum of five days at room temperature). Pure Strip is ready to use and requires no mixing.
應用
Pure Strip may be used at room temperature or at elevated temperature. Higher temperatures will increase the activity but decrease the bath life (1 day at 60-80 °C). Substrates are stripped of photoresist and cleaned effectively with minimal attack on aluminum (approximately 35 Angstroms/minute at room temperature) and negligible attack on other metals and alloys such as titanium, Ti-tungsten, copper, tantalum silicide, and ITO.
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A
儲存類別代碼
8B - Non-combustible corrosive hazardous materials
水污染物質分類（WGK）
WGK 3
閃點（°F）
Not applicable
閃點（°C）
Not applicable
Active Filters
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