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Merck
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重要文件

695106

Sigma-Aldrich

对苯二胺

sublimed, ≥99%

同義詞:

1,4-二氨基苯, 1,4-苯二胺, 对二氨基苯

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About This Item

線性公式:
C6H4(NH2)2
CAS號碼:
分子量::
108.14
Beilstein:
742029
EC號碼:
MDL號碼:
分類程式碼代碼:
12352100
PubChem物質ID:
NACRES:
NA.22
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蒸汽密度

3.7 (vs air)

品質等級

蒸汽壓力

1.08 mmHg ( 100 °C)

描述

anti-fade reagent

化驗

≥99%

形狀

sublimed

bp

267 °C (lit.)

mp

138-143 °C (lit.)

SMILES 字串

Nc1ccc(N)cc1

InChI

1S/C6H8N2/c7-5-1-2-6(8)4-3-5/h1-4H,7-8H2

InChI 密鑰

CBCKQZAAMUWICA-UHFFFAOYSA-N

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訊號詞

Danger

危險分類

Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Skin Sens. 1 - STOT SE 1 Oral

標靶器官

Kidney,Heart,Musculo-skeletal system

儲存類別代碼

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

水污染物質分類(WGK)

WGK 3

閃點(°F)

230.0 °F - closed cup

閃點(°C)

110 °C - closed cup

個人防護裝備

Eyeshields, Faceshields, Gloves, type P2 (EN 143) respirator cartridges


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Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

原子層沉積可滿足各種需求,包括半導體裝置微型化及奈米塗層。

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