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654892

Sigma-Aldrich

Aldrich® 负性光致抗蚀剂套装 I

别名:

Aldrich®负性光致抗蚀剂套装I

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About This Item

分類程式碼代碼:
12352300
NACRES:
NA.23

一般說明

Aldrich®负性光致抗蚀剂套装I由用于光蚀刻的材料组成。该光致抗蚀剂可旋涂于玻璃基质上以形成电极阵列。该套装还可用于在玻璃表面上进行掩膜和成像。

應用

Aldrich®负性光致抗蚀剂套装I已被用于通过光刻法制造微电极。它还可用于制造基于液滴的微流控器件、微流控芯片、玻璃光波导和集成光栅耦合器。

法律資訊

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC

试剂盒组分也可单独购买

产品编号
说明
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訊號詞

Danger

危險分類

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3

標靶器官

Central nervous system,Liver,Kidney, Respiratory system

儲存類別代碼

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

閃點（°F）

Not applicable

閃點（°C）

Not applicable

分析证书(COA)

输入产品批号来搜索 分析证书(COA) 。批号可以在产品标签上"批“ （Lot或Batch）字后找到。

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Fabrication and characterization of optical waveguides and grating couplers
J P Sharpe, et al.
European Journal of Physics, 34, 1317-1317 (2013)
High-speed droplet actuation on single-plate electrode arrays
Banerjee AN, et al.
Journal of Colloid and Interface Science, 362(2), 567-574 (2011)
Arghya Narayan Banerjee et al.
Journal of colloid and interface science, 362(2), 567-574 (2011-08-02)
This paper reports a droplet-based microfluidic device composed of patterned co-planar electrodes in an all-in-a-single-plate arrangement and coated with dielectric layers for electrowetting-on-dielectric (EWOD) actuation of discrete droplets. The co-planar arrangement is preferred over conventional two-plate electrowetting devices because it
A compact 3D-printed interface for coupling open digital microchips with Venturi easy ambient sonic-spray ionization mass spectrometry
Hu J, et al.
Analyst, 140(5), 1495-1501 (2015)
Fabrication and characterization of optical waveguides and grating couplers
Sharpe JP, et al.
European Journal of Physics, 34(5), 1317-1317 (2013)
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实验方案

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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