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儲存期限
1 yr (cool area away from direct sunlight)
pH值
<2 (20 °C)
bp
204-304 °C (lit.)
密度
1.00 g/mL at 25 °C (lit.)
儲存溫度
2-8°C
一般說明
訊號詞
Danger
危險分類
Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1
儲存類別代碼
8A - Combustible corrosive hazardous materials
水污染物質分類（WGK）
WGK 3
閃點（°F）
204.8 °F
閃點（°C）
96 °C
实验方案
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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