651826

Chromium etchant

standard

• 동의어(들): Cr etching solution
• MDL number: MFCD07370678
• UNSPSC 코드: 12352300
• NACRES: NA.23

속성

• Grade: standard
• Quality Level: 100
• 구성: volatiles, 85%
• 색상: orange
• bp: 100 °C/1 atm
• density: 1.16 g/mL at 25 °C

설명

일반 설명

• Appearance - Clear orange
• pH - Acidic
• Etch Rate at 40 °C - 40 Å/second
• Etch Capacity (rate declines at ~70%) - 65 g/gallon
• Shelf Life - 1 year
• Storage Conditions - Ambient
• Filtration - 0.2 µm
• Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
• Rinse - Deionized water
• Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
• Select Compatible Materials - Au, Ti, oxide, nitride, Si
• Select Incompatible Materials - Al, Ni, Cu, NiCr
• Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
• Isotropy - Isotropic
• Incompatible Chemicals - Strong bases

Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.

Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.[1][2][3][4]

Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

애플리케이션

For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si₃N₄, SiO₂, Ti, and W surfaces[5]

특징 및 장점

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.

안전성 정보

• 픽토그램: GHS03,GHS05,GHS07,GHS09
• 신호어: Danger
• 유해 및 위험 성명서: H272,H290,H314,H317,H411
• 예방조치 성명서: P210 - P220 - P273 - P280 - P303 + P361 + P353 - P305 + P351 + P338
• Hazard Classifications: Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
• 보충제 위험성: EUH071
• Storage Class Code: 5.1B - Oxidizing hazardous materials
• WGK: WGK 3
• Flash Point (°F): Not applicable
• Flash Point (°C): Not applicable