This product does not include H2SO4.
추천 제품
유통기한
1 yr (cool area away from direct sunlight)
Quality Level
pH
<2 (20 °C)
bp
204-304 °C (lit.)
density
1.00 g/mL at 25 °C (lit.)
저장 온도
2-8°C
일반 설명
Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1
Storage Class Code
8A - Combustible corrosive hazardous materials
WGK
WGK 3
Flash Point (°F)
204.8 °F
Flash Point (°C)
96 °C
프로토콜
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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For the 65,176-1 Negative Resist Remover, do we also buy H2SO4, or is that already in the 65, 176-1?
1 답변-
도움이 되었습니까?
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Is this remover available with AZ 5214E which is an IR photo-resist (positive to negative) ?
1 답변-
The photoresist remover AZ 5214E (or others options for positive and negative removal) is not available. Unfortunately, the 651761, which is also included in the Negative Photoresist kit (654892), are the only reagents offered at this time.
도움이 되었습니까?
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활성 필터
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.
