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  • Biodegradation of Various Aromatic Compounds by Enriched Bacterial Cultures: Part B--Nitrogen-, Sulfur-, and Oxygen-Containing Heterocyclic Aromatic Compounds.

Biodegradation of Various Aromatic Compounds by Enriched Bacterial Cultures: Part B--Nitrogen-, Sulfur-, and Oxygen-Containing Heterocyclic Aromatic Compounds.

Applied biochemistry and biotechnology (2015-06-10)
Akashdeep Singh Oberoi, Ligy Philip, S Murty Bhallamudi
要旨

Present study focused on the biodegradation of various heterocyclic nitrogen, sulfur, and oxygen (NSO) compounds using naphthalene-enriched culture. Target compounds in the study were pyridine, quinoline, benzothiophene, and benzofuran. Screening studies were carried out using different microbial consortia enriched with specific polycyclic aromatic hydrocarbon (PAH) and NSO compounds. Among different microbial consortia, naphthalene-enriched culture was the most efficient consortium based on high substrate degradation rate. Substrate degradation rate with naphthalene-enriched culture followed the order pyridine > quinoline > benzofuran > benzothiophene. Benzothiophene and benzofuran were found to be highly recalcitrant pollutants. Benzothiophene could not be biodegraded when concentration was above 50 mg/l. It was observed that 2-(1H)-quinolinone, benzothiophene-2-one, and benzofuran-2,3-dione were formed as metabolic intermediates during biodegradation of quinoline, benzothiophene, and benzofuran, respectively. Quinoline-N and pyridine-N were transformed into free ammonium ions during the biodegradation process. Biodegradation pathways for various NSO compounds are proposed. Monod inhibition model was able to simulate single substrate biodegradation kinetics satisfactorily. Benzothiophene and benzofuran biodegradation kinetics, in presence of acetone, was simulated using a generalized multi-substrate model.

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Sigma-Aldrich
アセトニトリル, anhydrous, 99.8%
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ピリジン, anhydrous, 99.8%
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キノリン, reagent grade, 98%
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アセトン, JIS special grade, ≥99.5%
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酢酸エチル, anhydrous, 99.8%
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ヘキサン, anhydrous, 95%
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2,3-ベンゾフラン, 99%
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酢酸エチル, ≥99%, FCC, FG
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アセトン, natural, ≥97%
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酢酸エチル
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ピリジン, ≥99%
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アセトン, SAJ first grade, ≥99.0%
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アセトン, ≥99%, meets FCC analytical specifications
Sigma-Aldrich
ヘキサン, JIS special grade, ≥96.0%
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アセトニトリル, electronic grade, 99.999% trace metals basis
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酢酸エチル, natural, ≥99%, FCC, FG
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アセトニトリル 溶液, contains 0.1 % (v/v) formic acid, suitable for HPLC
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アセトニトリル, ≥99.8%, suitable for HPLC
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チアナフテン, 98%
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アセトニトリル 溶液, contains 0.1 % (v/v) trifluoroacetic acid, suitable for HPLC
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ヘキサン, SAJ first grade, ≥95.0%
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アセトン, ≥99.5%, for residue analysis
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酢酸エチル, JIS special grade, ≥99.5%
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ピリジン, JIS special grade, ≥99.5%
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酢酸エチル
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酢酸エチル, ReagentPlus®, ≥99.8%
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ヘキサン, suitable for HPLC
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アセトニトリル, ≥99.8%, for residue analysis, JIS 300
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酢酸エチル, SAJ first grade, ≥99.0%
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ヘキサン, HPLC Plus, for HPLC, GC, and residue analysis, ≥95%