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Osmium ICP standard

(NH₄)₂OsCl₆ in HCl 7% 1000 mg/l Os Certipur®

Synonyma:

Osmium Calibration Standard for ICP

Přihlásitk zobrazení cen stanovených pro organizaci a smluvních cen


About This Item

UNSPSC Code:
41116107
NACRES:
NA.24

grade

certified reference material

Quality Level

product line

Certipur®

concentration

1000 mg/L Os in 7% HCl

technique(s)

ICP: suitable

density

1.034 g/cm3 at 20 °C

application(s)

industrial qc
pharmaceutical

format

single component solution

storage temp.

15-25°C

General description

This certified reference material (CRM) is produced in accordance with ISO 17034 and characterized in accordance with ISO/IEC 17025. This CRM is traceable to SI unit kg and measured against primary material from a National Metrology Institute (NMI), e.g. NIST.

Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.

Download your certificate at https://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.

Application

The osmium ICP standard may find the below uses:
  • To study the spatial distribution of isosteric osmium and ruthenium anticancer agents using laser ablation-inductively coupled plasma-mass spectrometry (LA-ICP-MS)
  • Determination of osmium by inductively coupled plasma-mass spectrometry (ICP-MS) after pressure vessel digestion with nitric acid
  • Development of a plasma induced vapor generation method to measure osmium in solutions by inductively coupled plasma-optical emission spectrometry (ICP-OES)
  • Study of serum-binding properties of two metallodrugs by size exclusion chromatography-inductively coupled plasma-mass spectrometry (SEC-ICP-MS)
  • Detection of osmium by Photochemical Vapor Generation-Inductively Coupled Plasma-Mass Spectrometry(PVG-ICP-MS)
  • Inductively coupled plasma-optical emission spectrometric (ICP-OES) determination of osmium by using photooxidation vapor generation (POVG) method

Other Notes

For a complete product listing of our ICP and AAS range, including technical information and example certificates, please visit ICP & AAS standards website.

Detailed information on our complete workflow solutions for ICP-AAS can be found in our Brochure: High-Purity Chemicals for Inorganic Trace Analysis.

In our effort to be more sustainable, we′re going digital with COAs-download them directly from our website.

Legal Information

CERTIPUR is a registered trademark of Merck KGaA, Darmstadt, Germany

pictograms

Corrosion

signalword

Warning

hcodes

Hazard Classifications

Met. Corr. 1

Storage Class

8B - Non-combustible corrosive hazardous materials

wgk_germany

WGK 2

flash_point_f

Not applicable

flash_point_c

Not applicable


Osvědčení o analýze (COA)

Vyhledejte osvědčení Osvědčení o analýze (COA) zadáním čísla šarže/dávky těchto produktů. Čísla šarže a dávky lze nalézt na štítku produktu za slovy „Lot“ nebo „Batch“.

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Zákazníci si také prohlíželi

Bioimaging of isosteric osmium and ruthenium anticancer agents by LA-ICP-MS
Klose M, et al.
Metallomics : Integrated Biometal Science, 10(3), 388-396 (2018)
Serum-binding properties of isosteric ruthenium and osmium anticancer agents elucidated by SEC-ICP-MS
Klose M, et al.
Monatshefte fur Chemie / Chemical Monthly, 149(10), 1719-1726 (2018)
On line vapor generation of osmium based on solution cathode glow discharge for the determination by ICP-OES
Zhu Z, et al.
Talanta, 106, 133-136 (2013)
Pharmacopeial requirements for elemental impurities: a novel approach to the trace determination of osmium by oxidative pressure vessel sample digestion and measurement using inductively coupled plasma mass spectrometry (ICP-MS) after complexation and stabilisation
Venzago C, et al.
Journal of Analytical Atomic Spectrometry, 28(7), 1125-1129 (2013)
Simultaneous Detection of Ruthenium and Osmium by Photochemical Vapor Generation-Inductively Coupled Plasma-Mass Spectrometry
Yang Q, et al.
Analytical Chemistry (2021)

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