Direkt zum Inhalt
Merck
Alle Fotos(2)

Dokumente

651796

Sigma-Aldrich

Negativ-Photoresist I

Anmeldenzur Ansicht organisationsspezifischer und vertraglich vereinbarter Preise
Alle Fotos(2)

About This Item

CAS-Nummer:
9003-31-0
MDL-Nummer:
MFCD00084438
UNSPSC-Code:
41116107
NACRES:
NA.23

Mol-Gew.

average Mw 60,000-70,000 (polyisoprene)

Zusammensetzung

solids, 27-29 wt. %

Dielektrizitätskonstante

2.4

Oberflächenspannung

29.2 dyn/cm

Viskosität

465-535 cP(25 °C)

bp

122-142 °C (lit.)

Dichte

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

Lagertemp.

2-8°C

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChIKey

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Verwandte Kategorien

Allgemeine Beschreibung

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

Signalwort

Danger

Gefahreneinstufungen

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

Zielorgane

Respiratory system

Lagerklassenschlüssel

3 - Flammable liquids

WGK

WGK 3

Flammpunkt (°F)

75.2 °F - closed cup

Flammpunkt (°C)

24 °C - closed cup

Persönliche Schutzausrüstung

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Analysenzertifikate (COA)

Suchen Sie nach Analysenzertifikate (COA), indem Sie die Lot-/Chargennummer des Produkts eingeben. Lot- und Chargennummern sind auf dem Produktetikett hinter den Wörtern ‘Lot’ oder ‘Batch’ (Lot oder Charge) zu finden.

Besitzen Sie dieses Produkt bereits?

In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.

Die Dokumentenbibliothek aufrufen

Gérald Guérin et al.
Journal of the American Chemical Society, 130(44), 14763-14771 (2008-10-14)
In alkane solvents, poly(isoprene-b-ferrocenyldimethylsilane) (PI-b-PFS) block copolymer forms fiberlike micelles, which show intriguing similarities with biological fibers such as amyloid fibers. Both systems exhibit fiber growth by a nucleated self-assembly mechanism and rapidly fragment upon exposure to the shear forces
Thomas Schmidt et al.
BMC biochemistry, 11, 11-11 (2010-02-23)
Natural rubber is a biopolymer with exceptional qualities that cannot be completely replaced using synthetic alternatives. Although several key enzymes in the rubber biosynthetic pathway have been isolated, mainly from plants such as Hevea brasiliensis, Ficus spec. and the desert
P Voudouris et al.
The Journal of chemical physics, 132(7), 074906-074906 (2010-02-23)
The primary alpha-relaxation time (tau(alpha)) for molecular and polymeric glass formers probed by dielectric spectroscopy and two light scattering techniques (depolarized light scattering and photon correlation spectroscopy) relates to the decay of the torsional autocorrelation function computed by molecular dynamics
Janina Post et al.
Plant physiology, 158(3), 1406-1417 (2012-01-13)
Certain Taraxacum species, such as Taraxacum koksaghyz and Taraxacum brevicorniculatum, produce large amounts of high-quality natural rubber in their latex, the milky cytoplasm of specialized cells known as laticifers. This high-molecular mass biopolymer consists mainly of poly(cis-1,4-isoprene) and is deposited
Kyoung-Yong Chun et al.
Nanotechnology, 24(16), 165401-165401 (2013-03-29)
The prospect of electronic circuits that are stretchable and bendable promises tantalizing applications such as skin-like electronics, roll-up displays, conformable sensors and actuators, and lightweight solar cells. The preparation of highly conductive and highly extensible materials remains a challenge for
Alle zugehörigen Dokumente anzeigen

Protokolle

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Unser Team von Wissenschaftlern verfügt über Erfahrung in allen Forschungsbereichen einschließlich Life Science, Materialwissenschaften, chemischer Synthese, Chromatographie, Analytik und vielen mehr..

Setzen Sie sich mit dem technischen Dienst in Verbindung.