553468

Tris(tert-butoxy)silanol

99.999%

• Synonym(e): TBS
• Lineare Formel: ((CH₃)₃CO)₃SiOH
• CAS-Nummer: 18166-43-3
• Molekulargewicht: 264.43
• MDL-Nummer: MFCD00271024
• UNSPSC-Code: 12352103
• PubChem Substanz-ID: 24879332
• NACRES: NA.23

Eigenschaften

• Qualitätsniveau: 100
• Assay: 99.999%
• Form: solid
• bp: 205-210 °C (lit.)
• mp (Schmelzpunkt): 63-65 °C (lit.)
• SMILES String: CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
• InChI: 1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
• InChIKey: HLDBBQREZCVBMA-UHFFFAOYSA-N

Beschreibung

Allgemeine Beschreibung

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.[1]

Anwendung

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH₃)₂)₄) for vapor phase deposition of hafnium silicate glass films.[1] Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.[2][3]

Sicherheitshinweise

• Lagerklassenschlüssel: 11 - Combustible Solids
• WGK: WGK 3
• Flammpunkt (°F): Not applicable
• Flammpunkt (°C): Not applicable
• Persönliche Schutzausrüstung: Eyeshields, Gloves, type N95 (US)