900814

SLAP TM

≥95%

• Synonyme(s) : 2-(((Trimethylsilyl)methyl)thio)ethanamine
• Formule empirique (notation de Hill): C₆H₁₇NSSi
• Numéro CAS: 1226877-72-0
• Poids moléculaire : 163.36
• Code UNSPSC : 12352200
• Nomenclature NACRES : NA.22

Propriétés

• Pureté: ≥95%
• Forme: liquid
• Indice de réfraction: n/D 1.4811
• Densité: 0.90746 g/mL
• Température de stockage: 2-8°C
• Chaîne SMILES: NCCSC[Si](C)(C)C

Description

Application

When used with aliphatic or aromatic aldehydes, this silicon amine protocol (SLAP) reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ ((747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Autres remarques

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informations sur la sécurité

• Code de la classe de stockage: 10 - Combustible liquids
• Classe de danger pour l'eau (WGK): WGK 3
• Point d'éclair (°F): 174.0 °F
• Point d'éclair (°C): 78.89 °C