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Sigma-Aldrich

Bis(cyclopentadienyl)cobalt(II)

Synonym(s):

Cobaltocene

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About This Item

Linear Formula:
Co(C5H5)2
CAS Number:
Molecular Weight:
189.12
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

form

powder or crystals
solid

reaction suitability

core: cobalt

mp

176-180 °C (dec.) (lit.)

storage temp.

2-8°C

SMILES string

[Co].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2

InChI

1S/2C5H5.Co/c2*1-2-4-5-3-1;/h2*1-5H;

InChI key

PXFGMRZPRDJDEK-UHFFFAOYSA-N

General description

Bis(cyclopentadienyl)cobalt(II) also known as cobaltocene, is an organometalliccompound that is widely used in the field of polymer synthesis, cobaltnanomaterials, and redox flow batteries.

Application

Bis(cyclopentadienyl)cobalt(II) can be used:
  • As a dopant to prepare encapsulated carbon nanotubes with high thermoelectric conversion efficiency.
  • As a CVD precursor to fabricate cobalt oxide thin films for various applications.
  • As a redox-active anode species in Li-based redox flow batteries to achieve higher energy densities and energy efficiencies.
  • As a catalyst for controlled/“living” radical polymerization of methylmethacrylate.

pictograms

FlameHealth hazard

signalword

Danger

Hazard Classifications

Carc. 2 - Flam. Sol. 2 - Muta. 2 - Resp. Sens. 1 - Skin Sens. 1

Storage Class

4.1B - Flammable solid hazardous materials

wgk_germany

WGK 3

ppe

Eyeshields, Gloves, type P3 (EN 143) respirator cartridges


Certificates of Analysis (COA)

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A high-performance all-metallocene-based, non-aqueous redox flow battery
Yu Ding, et al.
Energy & Environmental Science, 10, 491-497 (2017)
Thin films of cobalt oxide deposited on high aspect ratio supports by atomic layer deposition
Madeleine Diskus, et al
Chem. Vap. Deposition, 17, 135-140 (2011)
F Li et al.
Chemical science, 9(30), 6379-6389 (2018-10-13)
A series of NO-bound, iron-functionalized polyoxovanadate-alkoxide (FePOV-alkoxide) clusters have been synthesized, providing insight into the role of multimetallic constructs in the coordination and activation of a substrate. Upon exposure of the heterometallic cluster to NO, the vanadium-oxide metalloligand is oxidized
Jacob M Clary et al.
Nanotechnology, 31(17), 175703-175703 (2020-01-09)
Highly dispersed cobalt atoms were deposited on porous alumina particles using atomic layer deposition (ALD) with a CoCp2/H2 chemistry at approximately 7 wt%. H2 did not completely reduce the cyclopentadienyl organic ligands bound to deposited Co atoms at ALD reaction
Development of n-type cobaltocene-encapsulated carbon nanotubes with remarkable thermoelectric property
Takahiro Fukumaru, et al.
Scientific Reports, 5, 7951-7951 (2015)

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