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重要文件

920088

Sigma-Aldrich

Graphene, monolayer film

large grain, CVD graphene on copper foil, A5 size

同義詞:

Roll-to-Roll graphene

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About This Item

線性公式:
C
CAS號碼:
MDL號碼:
分類程式碼代碼:
12141908
NACRES:
NA.23
暫時無法取得訂價和供貨情況

產品名稱

R2R Monolayer large grain CVD graphene on copper foil, A5 size, avg. no. of layers, 1

品質等級

描述

Growth method: roll-to-roll CVD
Raman intensity 2D/G: ≥1.5
Number of layer: Monolayer

特點

avg. no. of layers 1

薄層電阻

280 Ω/sq ±10%

尺寸

110 μm × 110 μm ± 10%, grain size

厚度

35 μm , Cu Foil

表面覆盖率

surface coverage >98%

透射率

>97%

半導體屬性

(mobility>3000 cm2/V·s) (Hall effect measurements)

SMILES 字串

NC.NC.NC.NC.NC.NC.NC.NC.NC

InChI

1S/9CH5N/c9*1-2/h9*2H2,1H3

InChI 密鑰

DXIFQVRACSPGSU-UHFFFAOYSA-N

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一般說明

Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on copper foil, A5 size.

應用

Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.[1]

This large grain size product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET[2], CVD graphene based sensors, and heterostructure based micro/nano electronics[3].

Application examples:
  • Ultrafast Transistor
  • Optical devices
  • Bio/Gas Sensor
  • Transparent Electrode
  • Flexible Display
  • Smart Coating
  • Thermal management

注意

Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.

儲存和穩定性

Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.

法律資訊

Product of LG Electronics, R&D use only

象形圖

Environment

訊號詞

Warning

危險聲明

防範說明

危險分類

Aquatic Acute 1 - Aquatic Chronic 1

儲存類別代碼

13 - Non Combustible Solids

水污染物質分類(WGK)

WGK 2

閃點(°F)

Not applicable

閃點(°C)

Not applicable


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Hao-Ling Tang et al.
ACS nano, 11(12), 12817-12823 (2017-11-29)
Two-dimensional (2D) materials are drawing growing attention for next-generation electronics and optoelectronics owing to its atomic thickness and unique physical properties. One of the challenges posed by 2D materials is the large source/drain (S/D) series resistance due to their thinness
Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain

文章

Review on 1D vdWHs: Discusses materials, synthesis, optoelectronic applications, challenges, and future perspectives for 1D vdWH-based devices.

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