跳轉至內容
Merck
全部照片(4)

重要文件

553468

Sigma-Aldrich

三(叔丁氧基)硅烷醇

99.999%

同義詞:

TBS

登入查看組織和合約定價


About This Item

線性公式:
((CH3)3CO)3SiOH
CAS號碼:
分子量::
264.43
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23
暫時無法取得訂價和供貨情況

品質等級

化驗

99.999%

形狀

solid

bp

205-210 °C (lit.)

mp

63-65 °C (lit.)

SMILES 字串

CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C

InChI

1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3

InChI 密鑰

HLDBBQREZCVBMA-UHFFFAOYSA-N

尋找類似的產品? 前往 產品比較指南

一般說明

三(叔丁氧基)硅烷醇可以与各种金属烷基酰胺反应,作为气相沉积金属硅酸盐的前体。它也是二氧化硅沉积的理想前体。[1]

應用

三(叔丁氧基)硅烷醇与四(二甲基氨基)-铪蒸气(Hf(N(CH3)2)4)反应,用于硅酸铪玻璃膜的气相沉积。[1]三(叔丁氧基)硅烷醇被用于无定形二氧化硅和氧化铝纳米层的高度共形层的原子层沉积(ALD)。[2][3]

儲存類別代碼

11 - Combustible Solids

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

Eyeshields, Gloves, type N95 (US)


從最近期的版本中選擇一個:

分析證明 (COA)

Lot/Batch Number

未看到正確版本?

如果您需要一個特定的版本,您可以透過批號來尋找特定憑證。

已經擁有該產品?

您可以在文件庫中找到最近購買的產品相關文件。

存取文件庫

Vapor deposition of metal oxides and silicates: Possible gate insulators for future microelectronics.
Gordon G, et al.
Chemistry of Materials, 13(8), 2463-2464 (2001)
Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol.
Burton B, et al.
Chemistry of Materials, 20, 7031-7043 (2008)
Rapid vapor deposition of highly conformal silica nanolaminates.
Hausmann D, et al.
Science, 298(5592), 402-406 null
Jonathan Stewart et al.
Modern pathology : an official journal of the United States and Canadian Academy of Pathology, Inc, 28(3), 428-436 (2014-09-27)
The oncogenic role of WNT is well characterized. Wntless (WLS) (also known as GPR177, or Evi), a key modulator of WNT protein secretion, was recently found to be highly overexpressed in malignant astrocytomas. We hypothesized that this molecule may be
Pedro A Dionísio et al.
Neurobiology of aging, 36(1), 228-240 (2014-12-03)
Alzheimer's disease (AD) is a neurodegenerative disorder hallmarked by the accumulation of extracellular amyloid-β (Aβ) peptide and intraneuronal hyperphosphorylated tau, as well as chronic neuroinflammation. Tauroursodeoxycholic acid (TUDCA) is an endogenous anti-apoptotic bile acid with potent neuroprotective properties in several

文章

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

原子層沉積 (ALD)、微電子、Mo:Al2O3 薄膜、奈米複合鍍層、光電、半導體元件、W:Al2O3 薄膜、複合薄膜、逐層鍍膜

Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Questions

Reviews

No rating value

Active Filters

我們的科學家團隊在所有研究領域都有豐富的經驗,包括生命科學、材料科學、化學合成、色譜、分析等.

聯絡技術服務