跳轉至內容
Merck
全部照片(1)

重要文件

447048

Sigma-Aldrich

1,2-二(三氯甲硅烷基)乙烷

97%

同義詞:

1,1,1,4,4,4-六氯二甲硅基乙烯

登入查看組織和合約定價


About This Item

線性公式:
Cl3SiCH2CH2SiCl3
CAS號碼:
分子量::
296.94
Beilstein:
1753707
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23
暫時無法取得訂價和供貨情況

化驗

97%

形狀

solid

折射率

n20/D 1.475 (lit.)

bp

202 °C (lit.)

mp

27-29 °C (lit.)

密度

1.483 g/mL at 25 °C (lit.)

SMILES 字串

Cl[Si](Cl)(Cl)CC[Si](Cl)(Cl)Cl

InChI

1S/C2H4Cl6Si2/c3-9(4,5)1-2-10(6,7)8/h1-2H2

InChI 密鑰

WDVUXWDZTPZIIE-UHFFFAOYSA-N

尋找類似的產品? 前往 產品比較指南

一般說明

1,2-Bis(trichlorosilyl)ethane is an alkylchlorosilane that couples with surface atoms present on the metal surfaces. It is mainly utilized as a protective coating and a coupling agent that enhances the absorption of the self-assembled monolayer (SAM) on the surface of the metal. It chemically modifies the substrate material and acts as an anti-corrosive layer.[1][2][3]

象形圖

Corrosion

訊號詞

Danger

危險聲明

危險分類

Eye Dam. 1 - Skin Corr. 1B

安全危害

儲存類別代碼

8A - Combustible corrosive hazardous materials

水污染物質分類(WGK)

WGK 1

閃點(°F)

No data available

閃點(°C)

No data available

個人防護裝備

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


從最近期的版本中選擇一個:

分析證明 (COA)

Lot/Batch Number

未看到正確版本?

如果您需要一個特定的版本,您可以透過批號來尋找特定憑證。

已經擁有該產品?

您可以在文件庫中找到最近購買的產品相關文件。

存取文件庫

Chemical Modification of an Alkanethiol Self-Assembled Layer to Prevent Corrosion of Copper
Haneda R. et al.
Journal of the Electrochemical Society, 144(4), 1215-1221 (1997)
Packing Defects in Fatty Amine Self-Assembled Monolayers on Mica as Revealed from AFM Techniques
Beni?tez JJ, et al.
The Journal of Physical Chemistry B, 122(2), 493-499 (2017)
Preparation and Evaluation of Two-Dimensional Polymer Films by Chemical Modification of an Alkanethiol Self-Assembled Monolayer for Protection of Copper Against Corrosion
Itoh M, et al.
Journal of the Electrochemical Society, 142(11), 3696-3704 (1995)
Shengxia Li et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 21(49), 17762-17768 (2015-10-20)
New cross-linking reagents were synthesized and mixed with polystyrene (PS) in solution to form a blend. Thin-films were spin-coated from the blend and then cross-linked by thermal activation at relatively low temperature (100 °C) to form cross-linked gate dielectrics. This new

Questions

Reviews

No rating value

Active Filters

我們的科學家團隊在所有研究領域都有豐富的經驗,包括生命科學、材料科學、化學合成、色譜、分析等.

聯絡技術服務