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Key Documents

317004

Sigma-Aldrich

氟化钽(V)

98%

同義詞:

Tantalum pentafluoride

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About This Item

線性公式:
TaF5
CAS號碼:
分子量::
275.94
EC號碼:
MDL號碼:
分類程式碼代碼:
12352302
PubChem物質ID:
NACRES:
NA.23

品質等級

化驗

98%

形狀

powder

反應適用性

reagent type: catalyst
core: tantalum

密度

4.74 g/mL at 25 °C (lit.)

SMILES 字串

F[Ta](F)(F)(F)F

InChI

1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5

InChI 密鑰

YRGLXIVYESZPLQ-UHFFFAOYSA-I

一般說明

Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.

應用

Tantalum(V) fluoride can be used:
  • As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
  • As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
  • To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
  • As a catalyst for N-alkylation of arylamines with benzylalcohols.

象形圖

Corrosion

訊號詞

Danger

危險聲明

危險分類

Eye Dam. 1 - Skin Corr. 1B

儲存類別代碼

8B - Non-combustible corrosive hazardous materials

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


分析證明 (COA)

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Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)

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