推薦產品
品質等級
化驗
98%
形狀
powder
反應適用性
reagent type: catalyst
core: tantalum
密度
4.74 g/mL at 25 °C (lit.)
SMILES 字串
F[Ta](F)(F)(F)F
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
InChI 密鑰
YRGLXIVYESZPLQ-UHFFFAOYSA-I
一般說明
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
應用
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Skin Corr. 1B
儲存類別代碼
8B - Non-combustible corrosive hazardous materials
水污染物質分類(WGK)
WGK 3
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
分析證明 (COA)
輸入產品批次/批號來搜索 分析證明 (COA)。在產品’s標籤上找到批次和批號,寫有 ‘Lot’或‘Batch’.。
客戶也查看了
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Improvement of Hematite as Photocatalyst by Doping with Tantalum
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Lithium-Ion Batteries, 8, 184-184 (2022)
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