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Merck
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重要文件

116068

Sigma-Aldrich

N-羟乙基哌啶

ReagentPlus®, 99%

同義詞:

1-哌啶乙醇, N-哌啶乙醇

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About This Item

經驗公式(希爾表示法):
C7H15NO
CAS號碼:
分子量::
129.20
Beilstein:
103390
EC號碼:
MDL號碼:
分類程式碼代碼:
12352100
PubChem物質ID:
NACRES:
NA.22
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品質等級

產品線

ReagentPlus®

化驗

99%

折射率

n20/D 1.4804 (lit.)

bp

199-202 °C (lit.)

密度

0.973 g/mL at 25 °C (lit.)

官能基

hydroxyl

SMILES 字串

OCCN1CCCCC1

InChI

1S/C7H15NO/c9-7-6-8-4-2-1-3-5-8/h9H,1-7H2

InChI 密鑰

KZTWONRVIPPDKH-UHFFFAOYSA-N

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應用

1-(2-Hydroxyethyl)piperidine (1-Piperidineethanol) has been used as the base quencher to determine the efficiency of the decomposition of photoacid generators[1].
Counter-ion used for investigations of skin permeation of flurbiprofen[2]

Catalyst used for enantioselective synthesis[3]

Amine quencher used during synthesis of photoacid generators for ArF lithography[4]

Adsorbent for capture and release of pressurized carbon dioxide for greenhouse gas control[5]

法律資訊

ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany

象形圖

Exclamation mark

訊號詞

Warning

危險聲明

防範說明

危險分類

Acute Tox. 4 Oral

儲存類別代碼

10 - Combustible liquids

水污染物質分類(WGK)

WGK 3

閃點(°F)

156.2 °F - closed cup

閃點(°C)

69 °C - closed cup

個人防護裝備

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


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分析證明 (COA)

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Xu Ma et al.
Journal of pharmaceutical sciences, 99(4), 1826-1837 (2009-11-07)
The aim of this work was to investigate the percutaneous absorption of flurbiprofen (FP) using counter-ions as enhancers as well as to compare their enhancing activity with penetration enhancers in vitro. The in vitro permeation studies of FP were performed
A standard addition technique to quantify photoacid generation in chemically amplified photoresist.
Chemistry of Materials, 13(11), 4154-4162 (2001)
K. Tomizaki, et al.,
Chemistry Letters (Jpn), 37, 516-517 (2008)
François Lutz et al.
Journal of the American Chemical Society, 127(35), 12206-12207 (2005-09-01)
An asymmetric autocatalytic reaction has been catalyzed by a mixture of chiral and achiral beta-amino alcohols. The absolute configuration of the highly enantioenriched obtained product (>98% ee) was shown to depend not only on the absolute configuration of the chiral
T. Asakura, et al
J. Photopolym. Sci. Technol., 18, 407-414 (2005)

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