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Merck
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主要文件

1.07299

Sigma-Aldrich

4-(甲氨基)苯酚 半硫酸盐

Technipur®

别名:

米吐尔

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About This Item

线性分子式:
C7H9NO · 1/2H2SO4
CAS号:
分子量:
172.19
Beilstein:
3919382
MDL编号:
UNSPSC代码:
12352100
NACRES:
NA.05
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质量水平

自燃温度

989 °F

pH值(酸碱度)

3.5-4.5 (20 °C, 50 g/L in H2O)

mp

260 °C (dec.) (lit.)

SMILES字符串

OS(O)(=O)=O.CNc1ccc(O)cc1.CNc2ccc(O)cc2

InChI

1S/2C7H9NO.H2O4S/c2*1-8-6-2-4-7(9)5-3-6;1-5(2,3)4/h2*2-5,8-9H,1H3;(H2,1,2,3,4)

InChI key

ZVNPWFOVUDMGRP-UHFFFAOYSA-N

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一般描述

4-(Methylamino)Phenol Sulfate, a substituted phenol, is an aromatic reducing agent, majorly used as a hair dye and a monochrome photographic developer chemical.[1][2][3]

应用

4-(Methylamino)Phenol Sulfate can be used as a corrosion inhibitor.[4][5] It is used as a reagent in several reactions employed to determine the levels of contaminants[6][7] and drugs[8][9] by various means, particularly by electrochemical or spectrophotometric methods. 4-(Methylamino)Phenol Sulfate is also used as an organic reducing agent to prepare silver nanomaterials.[10]

法律信息

Technipur is a registered trademark of Merck KGaA, Darmstadt, Germany

警示用语:

Warning

危险分类

Acute Tox. 4 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Skin Sens. 1 - STOT RE 2

储存分类代码

13 - Non Combustible Solids

WGK

WGK 3

闪点(°F)

494.6 °F - closed cup

闪点(°C)

257 °C - closed cup


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Catalytic Determination of Vanadium Based on the
Bromate Oxidative-Coupling Reaction
of Metol with Phloroglucinol
Mohamed AA and Fawy KF
Mikrochimica Acta, 134, 229-235 (2000)
Room temperature synthesis of silver nanowires from tabular silver bromide crystals in the presence of gelatin
Liu S, et al.
Journal of Solid State Chemistry, 179(3), 696-701 (2006)
Metol as Corrosion Inhibitor for zinc
Praveen BM, et al.
Transactions of the Indian Institute of Metals, 65, 297-302 (2012)
Spectrophotometric Determination of Naproxen using Metol reagent by Oxidative Coupling Reaction
Ghania Abed Hasan GA and Bakir MH
IOP Conference Series: Materials Science and Engineering, 1058, 012079-012079 (2021)
Silver Nanoplates: Size Control in Two Dimensions and Formation Mechanisms
Sihai Chen S and Carroll DL
The Journal of Physical Chemistry B, 108, 5500-5506 (2004)

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