This product does not include H2SO4.
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保质期
1 yr (cool area away from direct sunlight)
pH值（酸碱度）
<2 (20 °C)
沸点
204-304 °C (lit.)
密度
1.00 g/mL at 25 °C (lit.)
储存温度
2-8°C
一般描述
低 pH 值配方，用于去除固化到各种基底上的光致抗蚀剂。不腐蚀金属和氧化物。不含氯化烃、铬酸盐、酚或磷酸盐。在室温和高温下均性能良好。
作为负性光致抗蚀剂套装 654892 的一部分提供
警示用语：
Danger
危险分类
Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1
储存分类代码
8A - Combustible corrosive hazardous materials
WGK
WGK 3
闪点(°F)
204.8 °F
闪点(°C)
96 °C
实验方案
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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For the 65,176-1 Negative Resist Remover, do we also buy H2SO4, or is that already in the 65, 176-1?
1 answer-
Helpful?
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Is this remover available with AZ 5214E which is an IR photo-resist (positive to negative) ?
1 answer-
The photoresist remover AZ 5214E (or others options for positive and negative removal) is not available. Unfortunately, the 651761, which is also included in the Negative Photoresist kit (654892), are the only reagents offered at this time.
Helpful?
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