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Merck

N7524

Sigma-Aldrich

双(环戊二烯)镍(II)

别名:

二茂镍, 双(氯茂基)镍(II)

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About This Item

线性分子式:
Ni(C5H5)2
CAS号:
分子量:
188.88
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

形狀

solid

成份

Ni, 20.0-31.5% EDTA titration

反應適用性

core: nickel
reagent type: catalyst

mp

171-173 °C (lit.)

SMILES 字串

[Ni].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2

InChI

1S/2C5H5.Ni/c2*1-2-4-5-3-1;/h2*1-5H;

InChI 密鑰

FOOKRXHSBKEWSE-UHFFFAOYSA-N

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應用

该金属烷基可用于合成杂化有机-无机聚合物分子层沉积(MLD)。双(环戊二烯基)镍(Cp 2 Ni)可以用作 NiO 前体,用于 NiO/碳纳米管杂化物的原子层沉积(ALD)。

訊號詞

Danger

危險分類

Acute Tox. 4 Oral - Carc. 1A - Flam. Sol. 1 - Skin Sens. 1

儲存類別代碼

4.1B - Flammable solid hazardous materials

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


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Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers.
George SM and Yoon B
Material Matters, 3(2), 34-37 null
Muhammad Hamid Raza et al.
ACS applied materials & interfaces, 12(4), 4594-4606 (2020-01-15)
The gas-sensing properties and mechanism and the role of the shell thickness of structurally well-defined SnO2/NiO heterostructures are studied. One-dimensional (1D) SnO2/NiO core-shell nanowires (CSNWs) were produced by a two-step process; single-crystalline SnO2-core nanowires (NWs) were synthesized by vapor-liquid-solid (VLS)
Enhanced Catalytic Activity for Methanol Electro-oxidation of Uniformly Dispersed Nickel Oxide Nanoparticles?Carbon Nanotube Hybrid Materials.
Tong X, et al.
Small, 8(22), 3390-3395 (2012)
Patrick P Komane et al.
International journal of molecular sciences, 21(7) (2020-03-29)
Currently, there is a lack of ultrasensitive diagnostic tool to detect some diseases such as ischemic stroke, thereby impacting effective and efficient intervention for such diseases at an embryonic stage. In addition to the lack of proper detection of the

商品

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

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