About This Item
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质量水平
方案
≥99.99% (trace metals analysis)
表单
low-melting solid
反应适用性
core: hafnium
mp
26-29 °C (lit.)
密度
1.098 g/mL at 25 °C
SMILES字符串
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI key
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
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一般描述
警示用语:
Danger
危险声明
危险分类
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
补充剂危害
储存分类代码
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
闪点(°F)
109.4 °F - closed cup
闪点(°C)
43 °C - closed cup
个人防护装备
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
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Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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