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Merck

669008

Sigma-Aldrich

四(二甲基胺基)钛(IV)

packaged for use in deposition systems

别名:

TDMAT, 四(二甲基氨基)钛(IV)

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About This Item

线性分子式:
[(CH3)2N]4Ti
CAS号:
分子量:
224.17
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

化驗

99.999% (trace metals analysis)

形狀

liquid

反應適用性

core: titanium

bp

50 °C/0.5 mmHg (lit.)

密度

0.947 g/mL at 25 °C (lit.)

SMILES 字串

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI 密鑰

MNWRORMXBIWXCI-UHFFFAOYSA-N

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一般說明

Atomic number of base material: 22 Titanium

應用

The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

象形圖

FlameCorrosion

訊號詞

Danger

危險聲明

危險分類

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

安全危害

儲存類別代碼

4.3 - Hazardous materials which set free flammable gases upon contact with water

水污染物質分類(WGK)

WGK 3

閃點(°F)

-22.0 °F - closed cup

閃點(°C)

-30 °C - closed cup

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


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Mikami K, et al. et al.
Science of Synthesis: Houben-Weyl Methods of Molecular Transformations, 2, 494-494 (2014)
Journal of Applied Physics, 102, 083521/1-083521/1 (2007)
Matthew T McDowell et al.
ACS applied materials & interfaces, 7(28), 15189-15199 (2015-06-18)
Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) onto various n-type semiconductors (Si, GaAs, GaP

商品

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

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