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  • Integration of advanced oxidation processes at mild conditions in wet scrubbers for odourous sulphur compounds treatment.

Integration of advanced oxidation processes at mild conditions in wet scrubbers for odourous sulphur compounds treatment.

Chemosphere (2014-05-31)
Esther Vega, Maria J Martin, Rafael Gonzalez-Olmos
ZUSAMMENFASSUNG

The effectiveness of different advanced oxidation processes on the treatment of a multicomponent aqueous solution containing ethyl mercaptan, dimethyl sulphide and dimethyl disulphide (0.5 mg L(-1) of each sulphur compound) was investigated with the objective to assess which one is the most suitable treatment to be coupled in wet scrubbers used in odour treatment facilities. UV/H2O2, Fenton, photo-Fenton and ozone treatments were tested at mild conditions and the oxidation efficiency obtained was compared. The oxidation tests were carried out in magnetically stirred cylindrical quartz reactors using the same molar concentration of oxidants (hydrogen peroxide or ozone). The results show that ozone and photo-Fenton are the most efficient treatments, achieving up to 95% of sulphur compounds oxidation and a mineralisation degree around 70% in 10 min. Furthermore, the total costs of the treatments taking into account the capital and operational costs were also estimated for a comparative purpose. The economic analysis revealed that the Fenton treatment is the most economical option to be integrated in a wet scrubber to remove volatile organic sulphur compounds, as long as there are no space constraints to install the required reactor volume. In the case of reactor volume limitation or retrofitting complexities, the ozone and photo-Fenton treatments should be considered as viable alternatives.

MATERIALIEN
Produktnummer
Marke
Produktbeschreibung

Sigma-Aldrich
Wasserstoffperoxid -Lösung, contains inhibitor, 30 wt. % in H2O, ACS reagent
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Dimethylsulfid, redistilled, ≥99%, FCC, FG
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Dimethyldisulfid, ≥99.0%
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Ethanethiol, 97%
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Dimethyldisulfid, ≥98%, FG
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Dimethylsulfid, natural, ≥99%, FCC, FG
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Dimethylsulfid, ≥99%
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Ethanethiol, ≥97%
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Natrium-ethanthiolat, technical grade, 80%
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