408964

メタクリル酸シクロヘキシル

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

• 別名: メタクリル酸シクロヘキシルエステル
• 化学式: CH₂=C(CH₃)COOC₆H₁₁
• CAS番号: 101-43-9
• 分子量: 168.23
• Beilstein: 2045235
• EC Number: 202-943-5
• MDL番号: MFCD00014292
• UNSPSCコード: 12162002
• PubChem Substance ID: 24865610
• NACRES: NA.23

特性

• アッセイ: ≥97%
• 形状: liquid
• 含みます: ~60 ppm monomethyl ether hydroquinone as inhibitor
• 屈折率: n20/D 1.458 (lit.)
• bp: 68-70 °C/4 mmHg (lit.)
• 密度: 0.964 g/mL at 25 °C (lit.)
• SMILES記法: CC(=C)C(=O)OC1CCCCC1
• InChI: 1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3
• InChI Key: OIWOHHBRDFKZNC-UHFFFAOYSA-N

詳細

詳細

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

アプリケーション

Cyclohexyl methacrylate can be used:

• As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
• As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
• As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

安全性情報

• ピクトグラム: GHS07
• シグナルワード: Warning
• 危険有害性情報: H315,H317,H319,H335
• 注意書き: P261 - P264 - P271 - P280 - P302 + P352 - P305 + P351 + P338
• 危険有害性の分類: Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3
• ターゲットの組織: Respiratory system
• 保管分類コード: 10 - Combustible liquids
• WGK: WGK 1
• 引火点(°F): 181.4 °F
• 引火点(℃): 83 °C
• 個人用保護具 (PPE): Eyeshields, Gloves, type ABEK (EN14387) respirator filter