GF81182820
Tantalum
foil, not light tested, 100x100mm, thickness 0.005mm, 99.9%
Sinonimo/i:
Tantalum, TA000140, Ta
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About This Item
Formula empirica (notazione di Hill):
Ta
Numero CAS:
Peso molecolare:
180.95
Numero MDL:
Codice UNSPSC:
12141741
ID PubChem:
NACRES:
NA.23
Per informazioni sul prodotto GF81182820, contatta il rappresentante o rivenditore Merck di zona. Contatta l'Assistenza Tecnica.
Tensione di vapore
<0.01 mmHg ( 537.2 °C)
Saggio
99.9%
Stato
foil
Temp. autoaccensione
572 °F
Produttore/marchio commerciale
Goodfellow 811-828-20
Resistività
13.5 μΩ-cm, 20°C
Misura × spessore
100 x 100 mm × 0.005 mm
P. ebollizione
5425 °C (lit.)
Punto di fusione
2996 °C (lit.)
Densità
16.69 g/cm3 (lit.)
Stringa SMILE
[Ta]
InChI
1S/Ta
GUVRBAGPIYLISA-UHFFFAOYSA-N
Descrizione generale
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I documenti relativi ai prodotti acquistati recentemente sono disponibili nell’Archivio dei documenti.
J G Sen Gupta
Talanta, 32(1), 1-6 (1985-01-01)
An improved graphite furnace atomic-absorption method has been developed for the determination of Sc, Y and the rare-earth elements in silicate rocks and related materials. The method, which involves the separation of the lanthanides by ion-exchange followed by their determination
Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
H H Pieper et al.
The Review of scientific instruments, 83(5), 055110-055110 (2012-06-07)
We present a versatile system for the preparation of oxide crystal surfaces in the ultra-high vacuum (UHV) at temperatures up to 1300 K. Thermal treatment is accomplished by direct current heating of a tantalum foil in contact with the oxide
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