GF15731186
Tantalum
foil, light tested, 25x25mm, thickness 0.01mm, 99.9%
Sinonimo/i:
Tantalum, TA000290, Ta
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About This Item
Formula empirica (notazione di Hill):
Ta
Numero CAS:
Peso molecolare:
180.95
Numero MDL:
Codice UNSPSC:
12141741
ID PubChem:
NACRES:
NA.23
Prezzi e disponibilità al momento non sono disponibili
Tensione di vapore
<0.01 mmHg ( 537.2 °C)
Saggio
99.90%
Stato
foil
Temp. autoaccensione
572 °F
Produttore/marchio commerciale
Goodfellow 157-311-86
Resistività
13.5 μΩ-cm, 20°C
Misura × spessore
25 x 25 mm × 0.01 mm
P. ebollizione
5425 °C (lit.)
Punto di fusione
2996 °C (lit.)
Densità
16.69 g/cm3 (lit.)
Stringa SMILE
[Ta]
InChI
1S/Ta
GUVRBAGPIYLISA-UHFFFAOYSA-N
Descrizione generale
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I documenti relativi ai prodotti acquistati recentemente sono disponibili nell’Archivio dei documenti.
Tantalum foil cuffs in peripheral nerve surgery.
E E CLIFFTON
Surgery, 23(3), 507-514 (1948-03-01)
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
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