推荐产品
蒸汽壓力
<0.01 mmHg ( 537.2 °C)
化驗
99.90%
形狀
foil
自燃溫度
572 °F
製造商／商標名
Goodfellow 144-749-76
電阻係數
13.5 μΩ-cm, 20°C
長度 × 寬度 × 厚度
0.1 m × 0.62 mm × 0.1 mm
bp
5425 °C (lit.)
mp
2996 °C (lit.)
密度
16.69 g/cm3 (lit.)
SMILES 字串
[Ta]
InChI
1S/Ta
InChI 密鑰
GUVRBAGPIYLISA-UHFFFAOYSA-N
一般說明
For updated SDS information please visit www.goodfellow.com.
法律資訊
Product of Goodfellow
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
T Y Hung et al.
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
Zhongli Cai et al.
Radiation research, 165(3), 365-371 (2006-02-24)
Both thick and thin films of pGEMR-3Zf- plasmid DNA deposited on a tantalum foil were exposed to soft X rays (effective energy of 14.8 keV) for various times in air under a relative humidity of 45% (Gamma approximately 6, where
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