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化驗
≥97.0% (GC)
形狀
liquid
折射率
n20/D 1.444
bp
66 °C/27 mmHg (lit.)
密度
1.026 g/mL at 20 °C (lit.)
SMILES 字串
CC(C)[Si](Cl)(Cl)C(C)C
InChI
1S/C6H14Cl2Si/c1-5(2)9(7,8)6(3)4/h5-6H,1-4H3
InChI 密鑰
GSENNYNYEKCQGA-UHFFFAOYSA-N
其他說明
基团保护试剂;引入的两个醇与"系链技术"密切相关
訊號詞
Danger
危險聲明
危險分類
Flam. Liq. 3 - Skin Corr. 1B
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
109.4 °F - closed cup
閃點(°C)
43 °C - closed cup
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
其他客户在看
Tetrahedron Letters, 32, 573-573 (1991)
Tetrahedron Letters, 36, 4189-4189 (1995)
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
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