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Merck

215066

Sigma-Aldrich

三氧化二镓

≥99.99% trace metals basis

别名:

氧化镓

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About This Item

经验公式(希尔记法):
Ga2O3
CAS号:
分子量:
187.44
EC號碼:
MDL號碼:
分類程式碼代碼:
12352303
PubChem物質ID:
NACRES:
NA.23

化驗

≥99.99% trace metals basis

形狀

(crystalline powder)

反應適用性

reagent type: catalyst
core: gallium

密度

5.88 g/mL at 25 °C

SMILES 字串

O=[Ga]O[Ga]=O

InChI

1S/2Ga.3O

InChI 密鑰

QZQVBEXLDFYHSR-UHFFFAOYSA-N

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一般說明

氧化镓(III)(Ga2O3)是一种宽带隙半导体,属于透明半导体氧化物(TSO)家族。它可以形成不同的多晶型,如α-、β-、γ-、δ- 和 ε-。多晶和纳米晶 Ga2O3 可以使用多种方法制备,如化学气相沉积、热蒸发和升华、分子束外延、熔体生长等。它被广泛用作各种应用的功能材料,包括光电子、化学传感器、催化、半导体器件、场效应晶体管等。

應用

Ga2O3 被广泛用作制造电致发光器件的主体材料。例如,可以使用掺杂铕的 Ga2O3 薄膜作为发光层来制造光学透明的电致发光器件。

由于其独特的光学和电学特性,如中等电导率和高激光损伤阈值,Ga2O3 可用于激光驱动的电子加速器、低损耗等离子体和硅基电介质激光加速器。

它也可以用作丙烷脱氢制丙烯的有效催化剂。
用于制备 Sr2CuGaO3S 的起始材料,这是一种罕见的方形金字塔镓的例子。

儲存類別代碼

11 - Combustible Solids

水污染物質分類(WGK)

WGK 2

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

Eyeshields, Gloves, type N95 (US)


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Naoya Kumagai et al.
Chemical communications (Cambridge, England), 47(6), 1884-1886 (2010-12-07)
Using the Rh(3+) ion (Rh d(6)) in a regular octahedral coordination, which forms fully occupied t(2g)(6) and empty e(g)(0) as a result of ligand-field splitting, we demonstrated that Rh-doped ZnGa(2)O(4) had midgap states created by t(2g)(6) and e(g)(0) that had
Bipin Pandey et al.
Langmuir : the ACS journal of surfaces and colloids, 28(38), 13705-13711 (2012-09-01)
This paper reports the formation of self-organized nanoporous gallium oxide by anodization of solid gallium metal. Because of its low melting point (ca. 30 °C), metallic gallium can be shaped into flexible structures, permitting the fabrication of nanoporous anodic oxide
Vladimir N Sigaev et al.
Nanoscale, 5(1), 299-306 (2012-11-21)
Nanoparticles in amorphous oxides are a powerful tool for embedding a wide range of functions in optical glasses, which are still the best solutions in several applications in the ever growing field of photonics. However, the control of the nanoparticle
Baoxiu Zhao et al.
Journal of environmental sciences (China), 24(4), 774-780 (2012-08-17)
Perfluorooctanoic acid (PFOA) is a new-found hazardous persistent organic pollutant, and it is resistant to decomposition by hydroxyl radical (HO*) due to its stable chemical structure and the high electronegativity of fluorine. Photocatalytic reduction of PFOA with beta-Ga2O3 in anoxic
The rate of charge tunneling through self-assembled monolayers is insensitive to many functional group substitutions.
Hyo Jae Yoon et al.
Angewandte Chemie (International ed. in English), 51(19), 4658-4661 (2012-04-17)

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