推荐产品
產品線
ReagentPlus®
化驗
99%
折射率
n20/D 1.4804 (lit.)
bp
199-202 °C (lit.)
密度
0.973 g/mL at 25 °C (lit.)
SMILES 字串
OCCN1CCCCC1
InChI
1S/C7H15NO/c9-7-6-8-4-2-1-3-5-8/h9H,1-7H2
InChI 密鑰
KZTWONRVIPPDKH-UHFFFAOYSA-N
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應用
1-(2-Hydroxyethyl)piperidine (1-Piperidineethanol) has been used as the base quencher to determine the efficiency of the decomposition of photoacid generators.
Counter-ion used for investigations of skin permeation of flurbiprofen
Catalyst used for enantioselective synthesis
Amine quencher used during synthesis of photoacid generators for ArF lithography
Adsorbent for capture and release of pressurized carbon dioxide for greenhouse gas control
Catalyst used for enantioselective synthesis
Amine quencher used during synthesis of photoacid generators for ArF lithography
Adsorbent for capture and release of pressurized carbon dioxide for greenhouse gas control
法律資訊
ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany
訊號詞
Warning
危險聲明
危險分類
Acute Tox. 4 Oral
儲存類別代碼
10 - Combustible liquids
水污染物質分類（WGK）
WGK 3
閃點（°F）
156.2 °F - closed cup
閃點（°C）
69 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
其他客户在看
Xu Ma et al.
Journal of pharmaceutical sciences, 99(4), 1826-1837 (2009-11-07)
The aim of this work was to investigate the percutaneous absorption of flurbiprofen (FP) using counter-ions as enhancers as well as to compare their enhancing activity with penetration enhancers in vitro. The in vitro permeation studies of FP were performed
T. Asakura, et al
J. Photopolym. Sci. Technol., 18, 407-414 (2005)
François Lutz et al.
Journal of the American Chemical Society, 127(35), 12206-12207 (2005-09-01)
An asymmetric autocatalytic reaction has been catalyzed by a mixture of chiral and achiral beta-amino alcohols. The absolute configuration of the highly enantioenriched obtained product (>98% ee) was shown to depend not only on the absolute configuration of the chiral
K. Tomizaki, et al.,
Chemistry Letters (Jpn), 37, 516-517 (2008)
A standard addition technique to quantify photoacid generation in chemically amplified photoresist.
Chemistry of Materials, 13(11), 4154-4162 (2001)
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