Direkt zum Inhalt
Merck

534633

Sigma-Aldrich

3-{3,5,7,9,11,13,15-Heptaisobutyl-pentacyclo[9.5.1.13,9.15,15.17,13]octasiloxan-1-yl}-propylmethacrylat

Synonym(e):

3-(3,5,7,9,11,13,15-Heptaisobutylpentacyclo[9.5.13,9.15,15.17,13]octasiloxan-1-yl)propylmethacrylate

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About This Item

Empirische Formel (Hill-System):
C35H74O14Si8
CAS-Nummer:
Molekulargewicht:
943.64
MDL-Nummer:
UNSPSC-Code:
12162002
PubChem Substanz-ID:
NACRES:
NA.23

mp (Schmelzpunkt)

108-112 °C (lit.)

SMILES String

CC(C)C[Si]12O[Si]3(CCCOC(=O)C(C)=C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]5(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O5

InChI

1S/C35H74O14Si8/c1-27(2)20-51-38-50(19-17-18-37-35(36)34(15)16)39-52(21-28(3)4)43-54(41-51,23-30(7)8)47-57(26-33(13)14)48-55(42-51,24-31(9)10)44-53(40-50,22-29(5)6)46-56(45-52,49-57)25-32(11)12/h27-33H,15,17-26H2,1-14,16H3

InChIKey

CVYLJMBNVJQTGW-UHFFFAOYSA-N

Allgemeine Beschreibung

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.

Anwendung

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.

Lagerklassenschlüssel

11 - Combustible Solids

WGK

WGK 3

Persönliche Schutzausrüstung

Eyeshields, Gloves, type N95 (US)


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Qing-Li Zhao et al.
Talanta, 152, 277-282 (2016-03-20)
Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic coating for capillary electrochromatography. The imprinted monolithic coating was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), S-amlodipine (template), methacrylic acid (functional monomer), and
Shu-Ping Gao et al.
Analytical and bioanalytical chemistry, 409(15), 3741-3748 (2017-03-28)
Polyhedral oligomeric silsesquioxane (POSS) was utilized to prepare imprinted polymer through reversible addition-fragmentation chain transfer polymerization (RAFT) successfully. The imprinted polymer was made with a mixture of RAFT agent, 4-vinylpyridine (4-VP), POSS monomer [PSS-(1-propylmethacrylate)-heptaisobutyl substituted, MA 0702], and ethylene glycol
Junjie Ou et al.
Analytica chimica acta, 761, 209-216 (2013-01-15)
A simple approach to fabricate hybrid monolithic column within the confines of fused-silica capillaries (75 μm i.d.) was introduced. A polyhedral oligomeric silsesquioxanes (POSS) reagent containing a methacrylate group was selected as functional monomer, and copolymerized with bisphenol A dimethacrylate

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