472956

Tungsten hexacarbonyl

99.99% trace metals basis (excluding Mo), purified by sublimation

• Synonyma: Hexacarbonyltungsten, Tungsten carbonyl, Tungsten hexacarbonyl
• Lineární vzorec: W(CO)₆
• Číslo CAS: 14040-11-0
• Molekulová hmotnost: 351.90
• NACRES: NA.23
• PubChem Substance ID: 24870851
• UNSPSC Code: 12352103
• EC Number: 237-880-2
• MDL number: MFCD00011462

Vlastnosti

• vapor density: 12.1 (vs air)
• Quality Segment: 200
• vapor pressure: 1.2 mmHg ( 67 °C)
• assay: 99.99% trace metals basis (excluding Mo)
• form: solid
• purified by: sublimation
• reaction suitability: core: tungsten, reagent type: catalyst
• mp: 150 °C (lit.)
• density: 2.65 g/mL at 25 °C (lit.)
• SMILES string: [W].[C-]#[O+].[C-]#[O+].[C-]#[O+].[C-]#[O+].[C-]#[O+].[C-]#[O+]
• InChI: 1S/6CO.W/c6*1-2;
• InChI key: FQNHWXHRAUXLFU-UHFFFAOYSA-N

Popis

General description

Atomic number of base material: 74 Tungsten

Tungsten hexacarbonyl is an organometallic compound that looks like a white crystalline solid. It is volatile and stable in inert environments. While it doesn′t dissolve well in water, it dissolves easily in non-polar organic solvents. This compound is mainly used in organometallic chemistry and materials science, especially for depositing tungsten films using chemical vapor deposition(CVD).

Application

Tungsten hexacarbonyl is used as a

• Reducing agent in the synthesis of uniform single and binary metal nanoparticles, for applications in catalysis, electronics, and materials science.
• Shape-directing agent in the low-temperature synthesis of non-spherical nickel nanocrystals, enabling the controlled formation of fivefold twinned nanorods and nanocubes with room-temperature ferromagnetic properties.
• Precursor in metal-organic chemical vapor deposition to synthesize Rhenium-Tungsten(Re–W) nanoparticles on carbon nanotubes
• Precursor in the aerosol-assisted chemical vapor deposition of WO₃ thin films, enabling the fabrication of hybrid heterojunction gas sensors with high sensitivity and stability for ammonia detection at room temperature.
• As an organometallic precursor to create metal-containing nanostructures in electron beam induced deposition (EBID).
• As a precursor for catalysts in alkene metathesis and ligand substitution reactions. It is commonly used in organometallic synthesis, as one or more CO ligands can be replaced by other donor ligands.

A precursor for the perparation of tungsten-containing complexes or nanomaterials. Also used in photochemistry

Catalyst used in the photochemical cyclization of silyloxytrienes via either a 6-endo pathway or a Cope rearrangement.

Features and Benefits

• 99.99% purity on a trace metals, ensuring optimal performance.
• Low impurities(≤ 150.0 ppm) in precursors minimize defects in the crystal structure of the synthesized material, enhancing performance and stability and forms uniform WO₃ films.
• Low metal content (such as Na, Zr, Cd, Cu, etc.) leads to reduced site reactions and increased yield in catalytic processes.

Bezpečnostní informace

• pictograms: GHS06
• signalword: Danger
• hcodes: H301 + H311 + H331
• pcodes: P261 - P264 - P280 - P301 + P310 - P302 + P352 + P312 - P304 + P340 + P311
• Hazard Classifications: Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral
• Skladovací třída: 6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects
• wgk: WGK 3
• flash_point_f: Not applicable
• flash_point_c: Not applicable
• ppe: Eyeshields, Gloves, type N95 (US)