Passa al contenuto
Merck
Tutte le immagini(2)

Documenti fondamentali

454516

Sigma-Aldrich

Tetrakis(trimethylsilyloxy)silane

97%

Sinonimo/i:

1,1,1,5,5,5-Hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane, Tetrakis(trimethylsilyl) silicate

Autenticatiper visualizzare i prezzi riservati alla tua organizzazione & contrattuali

Scegli un formato

5 ML
CHF 66.10

CHF 66.10


Check Cart for Availability

Richiedi un ordine bulk

Scegli un formato

Cambia visualizzazione
5 ML
CHF 66.10

About This Item

Formula condensata:
[(CH3)3SiO]4Si
Numero CAS:
Peso molecolare:
384.84
Numero CE:
Numero MDL:
Codice UNSPSC:
12352103
ID PubChem:
NACRES:
NA.22

CHF 66.10


Check Cart for Availability

Richiedi un ordine bulk

Livello qualitativo

Saggio

97%

Indice di rifrazione

n20/D 1.389 (lit.)

P. ebollizione

103-106 °C/2 mmHg (lit.)

Densità

0.87 g/mL at 25 °C (lit.)

Stringa SMILE

C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C

InChI

1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3
VNRWTCZXQWOWIG-UHFFFAOYSA-N

Applicazioni

Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure.[1] TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.[2]

Pittogrammi

Exclamation mark

Avvertenze

Warning

Indicazioni di pericolo

Classi di pericolo

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

Organi bersaglio

Respiratory system

Codice della classe di stoccaggio

10 - Combustible liquids

Classe di pericolosità dell'acqua (WGK)

WGK 3

Punto d’infiammabilità (°F)

168.8 °F - closed cup

Punto d’infiammabilità (°C)

76 °C - closed cup

Dispositivi di protezione individuale

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


Scegli una delle versioni più recenti:

Certificati d'analisi (COA)

Lot/Batch Number

Non trovi la versione di tuo interesse?

Se hai bisogno di una versione specifica, puoi cercare il certificato tramite il numero di lotto.

Possiedi già questo prodotto?

I documenti relativi ai prodotti acquistati recentemente sono disponibili nell’Archivio dei documenti.

Visita l’Archivio dei documenti

Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
Schafer, J, et al.
Surface and Coatings Technology, 295, 112-118 (2016)
Liqin Zhi et al.
Journal of environmental sciences (China), 76, 199-207 (2018-12-12)
Methylsiloxanes are a class of silicone compounds that have been widely used in various industrial processes and personal care products for several decades. This study investigated the spatial distribution of three cyclic methylsiloxanes (D4-D6) and twelve linear methylsiloxanes (L5-L16) in
Zichun Huang et al.
Water research, 185, 116224-116224 (2020-08-08)
Based on wastewater and raw/digested sludge samples from 29 wastewater treatment plants in 25 Chinese cities, the nationwide profiles of cis- and trans- isomers of phenylmethylsiloxanes (P3 and P4) and trifluoropropylmethylsiloxanes (D3F and D4F) were investigated. Calculated with paired influents/sludges
Junyu Guo et al.
Environment international, 143, 105931-105931 (2020-07-08)
Methylsiloxanes (MSs) are ubiquitous in indoor air and pose an important health risk. Thus, assessments of indoor inhalation exposure by measuring MSs levels in plasma are needed. In this study, we measured plasma MSs concentrations and evaluated daily indoor inhalation
Characteristics of Plasma Polymerized Low-dielectric Constant SiCOH Films Deposited with Tetrakis (trimethylsilyloxy) silane and Cyclohexane Precursors
Kim H, et al.
Bulletin of the Korean Chemical Society,, 35(10), 2941-2944 (2014)

Questions

  1. What precursors can be suggested for compatibility with our PECVD system in order to deposit thin films of TiO2?

    1 answer
    1. Typically, a volatile Ti compound such as Titanium(IV) isopropoxide (TTIP), TiCl4, Titanium alkoxides, Ti(acac)4, etc., can be used as the precursor for depositing thin films of TiO2 using a PECVD system. It's important to note that different precursors have different boiling points and may result in different surface structures and morphologies.

      Helpful?

Reviews

No rating value

Active Filters

Il team dei nostri ricercatori vanta grande esperienza in tutte le aree della ricerca quali Life Science, scienza dei materiali, sintesi chimica, cromatografia, discipline analitiche, ecc..

Contatta l'Assistenza Tecnica.