318272
Xenon difluoride
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About This Item
Formula condensata:
XeF2
Numero CAS:
Peso molecolare:
169.29
Numero CE:
Numero MDL:
Codice UNSPSC:
12352300
ID PubChem:
Prodotti consigliati
Tensione di vapore
3.8 mmHg ( 25 °C)
Punto di fusione
129 °C (lit.)
Densità
4.32 g/mL at 25 °C (lit.)
Stringa SMILE
F[Xe]F
InChI
1S/F2Xe/c1-3-2
IGELFKKMDLGCJO-UHFFFAOYSA-N
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Applicazioni
Very useful fluorination agent.
Avvertenze
Danger
Indicazioni di pericolo
Classi di pericolo
Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
Codice della classe di stoccaggio
5.1B - Oxidizing hazardous materials
Classe di pericolosità dell'acqua (WGK)
WGK 3
Punto d’infiammabilità (°F)
Not applicable
Punto d’infiammabilità (°C)
Not applicable
Dispositivi di protezione individuale
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
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Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Minseob Kim et al.
Nature chemistry, 2(9), 784-788 (2010-08-24)
The application of pressure, internal or external, transforms molecular solids into extended solids with more itinerant electrons to soften repulsive interatomic interactions in a tight space. Examples include insulator-to-metal transitions in O(2), Xe and I(2), as well as molecular-to-non-molecular transitions
Ariela W Kaspi et al.
Inorganic chemistry, 47(1), 5-7 (2007-12-07)
Palladium(II) aryliodo complexes bearing chelating diphosphine ligands react with XeF2, giving iodoarene and rare palladium(II) difluoro complexes. The reaction is general with regard to the aryl group, with even C6F5-I undergoing facile reductive elimination from a Pd center.
S S Nabiev
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 56A(8), 1589-1611 (2000-07-25)
Raman spectra of XeF4 and XeF6 in the nonaqueous HF solutions at various concentrations and vibrational spectra of the [XeF5]+ cation in the solid state and in the HF solutions over a wide range of vibrational frequencies have been studied.
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
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