GF83507238
Tantalum
foil, light tested, 100x100mm, thickness 0.03mm, as rolled, 99.9%
Sinônimo(s):
Tantalum, TA000348, Ta
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About This Item
Fórmula empírica (Notação de Hill):
Ta
Número CAS:
Peso molecular:
180.95
Número MDL:
Código UNSPSC:
12141741
ID de substância PubChem:
NACRES:
NA.23
Preço e disponibilidade não estão disponíveis no momento.
pressão de vapor
<0.01 mmHg ( 537.2 °C)
Ensaio
99.9%
Formulário
foil
temperatura de autoignição
572 °F
fabricante/nome comercial
Goodfellow 835-072-38
resistividade
13.5 μΩ-cm, 20°C
tamanho × espessura
100 x 100 mm × 0.03 mm
p.e.
5425 °C (lit.)
pf
2996 °C (lit.)
densidade
16.69 g/cm3 (lit.)
cadeia de caracteres SMILES
[Ta]
InChI
1S/Ta
chave InChI
GUVRBAGPIYLISA-UHFFFAOYSA-N
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Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
H H Pieper et al.
The Review of scientific instruments, 83(5), 055110-055110 (2012-06-07)
We present a versatile system for the preparation of oxide crystal surfaces in the ultra-high vacuum (UHV) at temperatures up to 1300 K. Thermal treatment is accomplished by direct current heating of a tantalum foil in contact with the oxide
Zhongli Cai et al.
Radiation research, 165(3), 365-371 (2006-02-24)
Both thick and thin films of pGEMR-3Zf- plasmid DNA deposited on a tantalum foil were exposed to soft X rays (effective energy of 14.8 keV) for various times in air under a relative humidity of 45% (Gamma approximately 6, where
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