Direkt zum Inhalt
Merck
Alle Fotos(1)

Dokumente

767506

Sigma-Aldrich

Titan

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis

Anmeldenzur Ansicht organisationsspezifischer und vertraglich vereinbarter Preise
Alle Fotos(1)

About This Item

Empirische Formel (Hill-System):
Ti
CAS-Nummer:
7440-32-6
Molekulargewicht:
47.87
EG-Nummer:
231-142-3
MDL-Nummer:
MFCD00011264
UNSPSC-Code:
12352103
PubChem Substanz-ID:
329767320
NACRES:
NA.23

Assay

99.995% trace metals basis

Form

solid

Selbstzündungstemp.

860 °F

Eignung der Reaktion

core: titanium

Widerstandsfähigkeit

42.0 μΩ-cm, 20°C

Durchm. × Dicke

2.00 in. × 0.25 in.

bp

3287 °C (lit.)

mp (Schmelzpunkt)

1660 °C (lit.)

Dichte

4.5 g/mL at 25 °C (lit.)

SMILES String

[Ti]

InChI

1S/Ti

InChIKey

RTAQQCXQSZGOHL-UHFFFAOYSA-N

Verwandte Kategorien

Anwendung

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Lagerklassenschlüssel

11 - Combustible Solids

WGK

nwg

Flammpunkt (°F)

Not applicable

Flammpunkt (°C)

Not applicable

Analysenzertifikate (COA)

Suchen Sie nach Analysenzertifikate (COA), indem Sie die Lot-/Chargennummer des Produkts eingeben. Lot- und Chargennummern sind auf dem Produktetikett hinter den Wörtern ‘Lot’ oder ‘Batch’ (Lot oder Charge) zu finden.

Besitzen Sie dieses Produkt bereits?

In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.

Die Dokumentenbibliothek aufrufen

Kostantinidis, S.; et al.
The European Physical Journal - Applied Physics, 56, 24002/1-24002/1 (2011)
Helmersson; U.; et al.
Thin Solid Films, 513, 1-1 (2006)
A Kurbad et al.
International journal of computerized dentistry, 16(2), 125-141 (2013-08-13)
This article presents two novel options for lithium-disilicate restorations supported by single-tooth implants. By using a Ti-Base connector, hybrid abutments and hybrid abutment crowns can be fabricated for different implant systems. The latter option in particular is an interesting new
J H Kim et al.
Journal of nanoscience and nanotechnology, 13(7), 4601-4607 (2013-08-02)
Nanocytalline TiN films were deposited on non-alkali glass and Al substrates by reactive DC magnetron sputtering (DCMS) with an electromagnetic field system (EMF). The microstructure and corrosion resistance of the TiN-coated Al substrates were estimated by X-ray diffraction (XRD), scanning
Jinho Shin et al.
Journal of nanoscience and nanotechnology, 13(8), 5807-5810 (2013-07-26)
In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface
Alle zugehörigen Dokumente anzeigen

Artikel

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Progress in Spintronic Materials

Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.

Nanowire Synthesis: From Top-Down to Bottom-Up

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

Unser Team von Wissenschaftlern verfügt über Erfahrung in allen Forschungsbereichen einschließlich Life Science, Materialwissenschaften, chemischer Synthese, Chromatographie, Analytik und vielen mehr..

Setzen Sie sich mit dem technischen Dienst in Verbindung.