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654892

Sigma-Aldrich

Aldrich® Negativ Fotolack Kit I

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About This Item

UNSPSC-Code:
12352300
NACRES:
NA.23

Lagertemp.

2-8°C

Qualitätsniveau

100

Verwandte Kategorien

Allgemeine Beschreibung

Aldrich® Negative Photoresist Kit I consists of materials for photolithography. The photoresist can be spin coated on the glass substrate for the formation of electrode arrays. The kit also provides masking and patterning on the glass surface.

Anwendung

Aldrich® Negative Photoresist Kit I has been used in the fabrication of microelectrodes by photolithography. It can also be used to fabricate the droplet-based microfluidic device, microfluidic chips, glass optical waveguides, and integrated grating couplers.

Rechtliche Hinweise

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC

Kit-Komponenten auch einzeln erhältlich

Produkt-Nr.
Beschreibung
SDB
  • 651761Negative resist remover I 250 mLSDB
  • 651788Negative resist developer I 250 mLSDB
  • 651796Negative photoresist I 100 mLSDB
  • 651974Negative resist thinner I 100 mLSDB

Signalwort

Danger

Gefahreneinstufungen

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3

Zielorgane

Central nervous system,Liver,Kidney, Respiratory system

Lagerklassenschlüssel

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

Flammpunkt (°F)

Not applicable

Flammpunkt (°C)

Not applicable

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Analysenzertifikate (COA)

Lot/Batch Number

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Die Dokumentenbibliothek aufrufen

Fabrication and characterization of optical waveguides and grating couplers
J P Sharpe, et al.
European Journal of Physics, 34, 1317-1317 (2013)
High-speed droplet actuation on single-plate electrode arrays
Banerjee AN, et al.
Journal of Colloid and Interface Science, 362(2), 567-574 (2011)
Arghya Narayan Banerjee et al.
Journal of colloid and interface science, 362(2), 567-574 (2011-08-02)
This paper reports a droplet-based microfluidic device composed of patterned co-planar electrodes in an all-in-a-single-plate arrangement and coated with dielectric layers for electrowetting-on-dielectric (EWOD) actuation of discrete droplets. The co-planar arrangement is preferred over conventional two-plate electrowetting devices because it
Fabrication and characterization of optical waveguides and grating couplers
Sharpe JP, et al.
European Journal of Physics, 34(5), 1317-1317 (2013)
Jie-Bi Hu et al.
The Analyst, 140(5), 1495-1501 (2015-01-28)
Digital microfluidics (DMF) based on the electrowetting-on-dielectric phenomenon is a convenient way of handling microlitre-volume aliquots of solutions prior to analysis. Although it was shown to be compatible with on-line mass spectrometric detection, due to numerous technical obstacles, the implementation
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Protokolle

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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