Typically, a volatile Ti compound such as Titanium(IV) isopropoxide (TTIP), TiCl4, Titanium alkoxides, Ti(acac)4, etc., can be used as the precursor for depositing thin films of TiO2 using a PECVD system. It's important to note that different precursors have different boiling points and may result in different surface structures and morphologies.
Fortfahren mit
454516
Tetrakis(trimethylsilyloxy)silan
97%
Synonym(e):
1,1,1,5,5,5-Hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane, Tetrakis(trimethylsilyl) silicate
Anmelden zur Ansicht der Organisations- und Vertragspreise.
Größe auswählen
Ansicht ändern
| Ihnen/SKU | Verfügbarkeit | Preis |
|---|---|---|
5 mL | Warenkorb auf Verfügbarkeit prüfen | € 78,80 € 59,10 |
Über diesen Artikel
Lineare Formel:
[(CH3)3SiO]4Si
CAS-Nummer:
Molekulargewicht:
384.84
NACRES:
NA.22
PubChem Substance ID:
UNSPSC Code:
12352103
EC Number:
222-613-4
MDL number:
€ 59,10
Listenpreis€ 78,80Sparen Sie 25%Aktion nur im Web
Warenkorb auf Verfügbarkeit prüfen
Technischer Dienst
Benötigen Sie Hilfe? Unser Team von erfahrenen Wissenschaftlern ist für Sie da.
Unterstützung erhaltenQuality Segment
assay
97%
refractive index
n20/D 1.389 (lit.)
bp
103-106 °C/2 mmHg (lit.)
density
0.87 g/mL at 25 °C (lit.)
functional group
silyl
SMILES string
C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C
InChI
1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3
InChI key
VNRWTCZXQWOWIG-UHFFFAOYSA-N
Application
Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure. TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.
1 of 1
Dieser Artikel | |||
|---|---|---|---|
| description 97% | description 97% | description 99% | description 97% |
| assay 97% | assay 97% | assay 99% | assay 97% |
| density 0.87 g/mL at 25 °C (lit.) | density 0.827 g/mL at 25 °C (lit.) | density 0.873 g/mL at 25 °C (lit.) | density 0.877 g/mL at 25 °C (lit.) |
| Quality Level 100 | Quality Level 100 | Quality Level 100 | Quality Level 100 |
| refractive index n20/D 1.389 (lit.) | refractive index n20/D 1.464 (lit.) | refractive index n20/D 1.491 (lit.) | refractive index n20/D 1.510 (lit.) |
| bp 103-106 °C/2 mmHg (lit.) | bp 55-56 °C/2 mmHg (lit.) | bp 168-170 °C (lit.) | bp 120 °C (lit.) |
| functional group silyl | functional group - | functional group silyl | functional group silyl |
signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
Lagerklasse
10 - Combustible liquids
wgk
WGK 3
flash_point_f
168.8 °F - closed cup
flash_point_c
76 °C - closed cup
ppe
Eyeshields, Gloves, type ABEK (EN14387) respirator filter
Hier finden Sie alle aktuellen Versionen:
Besitzen Sie dieses Produkt bereits?
In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.
-
What precursors can be suggested for compatibility with our PECVD system in order to deposit thin films of TiO2?
1 answer-
Helpful?
-