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408964

Methacrylsäure-cyclohexylester

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Synonym(e):

Cyclohexyl-methacrylat

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Größe/SKUVerfügbarkeitPreis
100 mL
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€ 128,00
€ 96,00
250 mL
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€ 155,00

Über diesen Artikel

Lineare Formel:
CH2=C(CH3)COOC6H11
CAS-Nummer:
Molekulargewicht:
168.23
UNSPSC Code:
12162002
NACRES:
NA.23
PubChem Substance ID:
EC Number:
202-943-5
Beilstein/REAXYS Number:
2045235
MDL number:

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Quality Segment

assay

≥97%

form

liquid

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

refractive index

n20/D 1.458 (lit.)

bp

68-70 °C/4 mmHg (lit.)

density

0.964 g/mL at 25 °C (lit.)

SMILES string

CC(=C)C(=O)OC1CCCCC1

InChI

1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3

InChI key

OIWOHHBRDFKZNC-UHFFFAOYSA-N

General description

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Application

Cyclohexyl methacrylate can be used:



  • As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
  • As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
  • As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

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Dieser Artikel
9600817348444006
description

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

description

-

description

-

description

contains MEHQ as inhibitor, 97%

assay

≥97%

assay

≥97.0% (GC)

assay

≥99%

assay

97%

density

0.964 g/mL at 25 °C (lit.)

density

0.964 g/mL at 25 °C (lit.)

density

1.071 g/mL at 20 °C, 1.073 g/mL at 25 °C (lit.)

density

1.345 g/mL at 25 °C (lit.)

refractive index

n20/D 1.458 (lit.)

refractive index

n20/D 1.458 (lit.)

refractive index

n20/D 1.453

refractive index

n20/D 1.341 (lit.)

bp

68-70 °C/4 mmHg (lit.)

bp

68-70 °C/4 mmHg (lit.)

bp

67 °C/3.5 mmHg (lit.)

bp

134-136 °C (lit.)

form

liquid

form

-

form

liquid

form

liquid

contains

~60 ppm monomethyl ether hydroquinone as inhibitor

contains

10-80 ppm monomethyl ether hydroquinone as inhibitor as stabilizer

contains

~0.001% hydroquinone monomethyl ether as stabilizer

contains

MEHQ as inhibitor


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Piktogramme

Exclamation mark

Signalwort

Warning

Gefahrencodes

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3

Zielorgane

Respiratory system

Lagerklasse

10 - Combustible liquids

Was ist los?

WGK 1

Flammpunkt (°F)

181.4 °F

Flammpunkt (°C)

83 °C

PSA (Persönliche Schutzausrüstung)

Eyeshields, Gloves, type ABEK (EN14387) respirator filter



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