40233

Hydrochloric acid

≥32%, semiconductor grade PURANAL^™ (Honeywell^® 17863)

• Synonym(s): Hydrogen chloride (HCl)
• Empirical Formula (Hill Notation): HCl
• CAS Number: 7647-01-0
• Molecular Weight: 36.46
• Beilstein/REAXYS Number: 1098214
• MDL number: MFCD00011324
• UNSPSC Code: 12352300
• PubChem Substance ID: 57649945

Properties

• Product Name: Hydrochloric acid, ≥32%
• vapor density: 1.3 (vs air)
• vapor pressure: 3.23 psi ( 21.1 °C); 7.93 psi ( 37.7 °C)
• assay: ≥32%
• CofA: specification on request
• concentration: 90-100%
• color: clear light yellow
• bp: >100 °C (lit.)
• solubility: H₂O: miscible (completely)
• density: 1.18 g/L at 20 °C
• SMILES string: Cl
• InChI: 1S/ClH/h1H
• InChI key: VEXZGXHMUGYJMC-UHFFFAOYSA-N

Description

General description

Semiconductor grade hydrochloric acid has been characterized by inductively couple plasma mass spectrometry (ICP-MS). The trace detection of V, Cr, As and Se in 20% HCl was determined in the study. [1] Its efficiency as a microabrasive was studied. [2]

Application

Hydrochloric acid may be used in the formulation of “standard cleaning bath” to purify metallurgical grade silicon (MGS) and polysilicon.[3] Varying concentrations of the acid aided formation of spherical and rod like cellulose nanocrystals.[4] Aqueous mixture of hydrochloric acid and Α-hydroxy acids (lactic, citric, malic, and tartaric acids) may be used to etch a III-V semiconductor (InP). [5]

Safety Information

• pictograms: GHS05,GHS07
• signalword: Danger
• hcodes: H290,H314,H335
• pcodes: P234 - P261 - P271 - P280 - P303 + P361 + P353 - P305 + P351 + P338
• Hazard Classifications: Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B - STOT SE 3
• target_organs: Respiratory system
• Storage Class: 8B - Non-combustible corrosive hazardous materials
• wgk_germany: WGK 1
• flash_point_f: Not applicable
• flash_point_c: Not applicable
• ppe: Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter