NIST2137
Boron implant in silicon standard for calibration of concentration in a depth profile
NIST® SRM® 2137
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About This Item
UNSPSC Code:
12352200
NACRES:
NA.24
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grade
certified reference material
packaging
pkg of each
manufacturer/tradename
NIST®
application(s)
semiconductor
format
matrix material
General description
This Standard Reference Material (SRM) is intended for use in calibrating the secondary ion response to minor and trace levels of boron in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). A unit of SRM 2137 consists of a single crystal silicon substrate with a surface rendered disordered by silicon ion implantation. For more information, please refer to the SDS and COA.
SRM 2137_cert
SRM 2137_SDS
SRM 2137_cert
SRM 2137_SDS
Other Notes
Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Boron (10B)
See certificate for values and more details at nist.gov/SRM.
Boron (10B)
See certificate for values and more details at nist.gov/SRM.
Legal Information
NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology
related product
Storage Class
13 - Non Combustible Solids
wgk_germany
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
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Certificates of Analysis (COA)
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