688509
Silicon tetrachloride
packaged for use in deposition systems
Synonym(s):
STC, Tetrachlorosilane
About This Item
Recommended Products
vapor density
5.86 (vs air)
Quality Level
vapor pressure
420 mmHg ( 37.7 °C)
assay
99.998% trace metals basis
form
liquid
reaction suitability
core: silicon
bp
57.6 °C (lit.)
mp
−70 °C (lit.)
density
1.483 g/mL at 25 °C (lit.)
SMILES string
Cl[Si](Cl)(Cl)Cl
InChI
1S/Cl4Si/c1-5(2,3)4
InChI key
FDNAPBUWERUEDA-UHFFFAOYSA-N
Looking for similar products? Visit Product Comparison Guide
General description
Application
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3
target_organs
Respiratory system
supp_hazards
Storage Class
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk_germany
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles
Certificates of Analysis (COA)
Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Customers Also Viewed
Articles
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service